SCHEMBL5015684

SCHEMBL5015684

OCC[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1345313 0.81
SCHEMBL2240752 0.79
SCHEMBL607280 0.72
SCHEMBL2853856 0.72 TSHR (0.46)
SCHEMBL5016177 0.67
SCHEMBL1420629 0.67
SCHEMBL5016054 0.67
SCHEMBL5077550 0.67
SCHEMBL8027814 0.67
SCHEMBL247602 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7393911-B2 Organosilicon fine particles and method of producing same TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2008-07-01 US disclosed
US-20060089478-A1 antireflection and antiblocking characteristics to synthetic polymer films and sheets when applied to their surface or caused to be contained, respectively, and adherence and slip characteristics to a skin care cosmetic material when caused to be contained TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) 2006-04-27 US disclosed