SCHEMBL501837

SCHEMBL501837

C=C1C(=O)CCC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21954840 0.89 TRIM24 (0.39)
SCHEMBL21954813 0.85 TRIM24 (0.41)
SCHEMBL7542218 0.85
SCHEMBL8320870 0.82
SCHEMBL899976 0.75
SCHEMBL5598603 0.72
SCHEMBL21954816 0.69
SCHEMBL21954818 0.67
SCHEMBL19457291 0.64
SCHEMBL9134442 0.64 TRIM24 (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11512158-B2 Self-polishing zwitterionic anti-fouling resin having main chain degradability and preparation therefor and use thereof SOUTH CHINA UNIVERSITY OF TECHNOLOGY (CN) 2022-11-29 US disclosed
US-20220017474-A1 Novel Polycyclic Compound EUTEC NEW MATERIALS TECHNOLOGY (SUZHOU) CO., LTD. (CN) 2022-01-20 US disclosed
US-20200157338-A1 SELF-POLISHING ZWITTERIONIC ANTI-FOULING RESIN HAVING MAIN CHAIN DEGRADABILITY AND PREPARATION THEREFOR AND USE THEREOF SOUTH CHINA UNIVERSITY OF TECHNOLOGY (CN) 2020-05-21 US disclosed
US-8197722-B2 Irradiating the compound (containing two electron donor groups and a bridge of pi-conjugated bonds containing electron donor groups) with light, and the compound is converted to a multi-photon electronically excited state THE CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2012-06-12 US disclosed
US-8106211-B2 Substituted enaminocarbonyl compounds BAYER CROPSCIENCE AG (DE) 2012-01-31 US disclosed
US-8084452-B2 Substituted enaminocarbonyl compounds used as insecticides BAYER CROPSCIENCE AG (DE) 2011-12-27 US disclosed
US-8039625-B2 Coronene charge-transport materials, methods of fabrication thereof, and methods of use thereof GEORGIA TECH RESEARCH CORPORATION (US) 2011-10-18 US disclosed
US-8039532-B2 Heterocyclic compound, ultraviolet absorbent and composition containing the same FUJIFILM CORPORATION (JP) 2011-10-18 US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 US disclosed
EP-1445649-B1 Silver halide photographic light-sensitive material comprising a particular dye, a hydrazine derivate and a benzotriazole compound FUJIFILM CORP (JP) 2007-08-22 EP disclosed
EP-0883642-B1 POLY(ESTER-ANHYDRIDES) AND INTERMEDIATES THEREFOR DEPUY ORTHOPAEDICS INC (US) 2003-07-30 EP disclosed
EP-0883642-A4 POLY(ESTER-ANHYDRIDES) AND INTERMEDIATES THEREFOR DEPUY ORTHOPAEDICS INC (US) 2000-08-16 EP disclosed
EP-0883642-A1 POLY(ESTER-ANHYDRIDES) AND INTERMEDIATES THEREFOR DEPUY ORTHOPAEDICS, INC. (US) 1998-12-16 EP disclosed
US-5756652-A Poly (ester-anhydrides) and intermediates therefor DEPUY ORTHOPAEDICS, INC. (US) 1998-05-26 US disclosed
WO-1997031966-A1 POLY(ESTER-ANHYDRIDES) AND INTERMEDIATES THEREFOR DEPUY ORTHOPAEDICS, INC. (US) 1997-09-04 WO disclosed