SCHEMBL7542218

SCHEMBL7542218

C=C1C(=O)CCCC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21954813 0.93 TRIM24 (0.41)
SCHEMBL5598603 0.87
SCHEMBL501837 0.85
SCHEMBL289021 0.76
SCHEMBL21954840 0.76 TRIM24 (0.39)
SCHEMBL1072352 0.76
SCHEMBL18637156 0.76 ALDH1A1 (0.36)
SCHEMBL6573461 0.72
SCHEMBL4269106 0.72
SCHEMBL29663753 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11512158-B2 Self-polishing zwitterionic anti-fouling resin having main chain degradability and preparation therefor and use thereof SOUTH CHINA UNIVERSITY OF TECHNOLOGY (CN) 2022-11-29 US disclosed
US-20200157338-A1 SELF-POLISHING ZWITTERIONIC ANTI-FOULING RESIN HAVING MAIN CHAIN DEGRADABILITY AND PREPARATION THEREFOR AND USE THEREOF SOUTH CHINA UNIVERSITY OF TECHNOLOGY (CN) 2020-05-21 US disclosed
US-8197722-B2 Irradiating the compound (containing two electron donor groups and a bridge of pi-conjugated bonds containing electron donor groups) with light, and the compound is converted to a multi-photon electronically excited state THE CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2012-06-12 US disclosed
US-8039532-B2 Heterocyclic compound, ultraviolet absorbent and composition containing the same FUJIFILM CORPORATION (JP) 2011-10-18 US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-7887998-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2011-02-15 US disclosed
US-20100210762-A1 HETEROCYCLIC COMPOUND, ULTRAVIOLET ABSORBENT AND COMPOSITION CONTAINING THE SAME FUJIFILM CORPORATION (JP) 2010-08-19 US disclosed
US-20100130638-A1 ULTRAVIOLET ABSORBENT COMPOSITION FUJIFILM CORPORATION (JP) 2010-05-27 US disclosed
US-20100025642-A1 ULTRAVIOLET ABSORBENT COMPOSITION FUJIFILM CORPORATION (JP) 2010-02-04 US disclosed
US-20090240067-A1 METHOD OF PRODUCING A BISBENZODITHIOL COMPOUND FUJIFILM CORPORATION (JP) 2009-09-24 US disclosed
US-20090058982-A1 OPTICAL RECORDING MEDIUM AND METHOD OF RECORDING VISIBLE INFORMATION FUJIFILM CORPORATION (JP) 2009-03-05 US disclosed
US-20090022047-A1 OPTICAL RECORDING MEDIUM AND METHOD OF RECORDING VISIBLE INFORMATION FUJIFILM CORPORATION (JP) 2009-01-22 US disclosed
US-20080283804-A1 include a bridge of pi-conjugated bonds connecting electron donating or accepting groups; electronically excited upon absorption lead to formation of Lewis acidic species, Lewis basic species, radical species or ionic species; chromogens use in engineering, biological, and medicinal field CALIFORNIA INSTITUTE OF TECHNOLOGY 2008-11-20 US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-7303851-B2 Silver halide photographic light-sensitive material FUJIFILM CORPORATION (JP) 2007-12-04 US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 US disclosed
US-20070224536-A1 SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIAL HIRANO MITSUNORI 2007-09-27 US disclosed
CN-1685005-A Oxygen-absorbing resin composition and laminate TOYO SEIKAN KAISHA LTD (JP) 2005-10-19 CN disclosed
EP-1207909-A2 METHOD FOR COUPLING MOLECULES MEDICAL RESEARCH COUNCIL (GB) 2002-05-29 EP disclosed
WO-2001015737-A2 METHOD FOR COUPLING MOLECULES MEDICAL RESEARCH COUNCIL (GB) 2001-03-08 WO disclosed