Formaldehyde

Formaldehyde

SCHEMBL5025876

C=O.C=O.O=CO[SiH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6370 0.91
Formaldehyde SCHEMBL23878253 0.67
Formaldehyde SCHEMBL1422200 0.64
Formic Acid Methyl Ester SCHEMBL935198 0.64
SCHEMBL874283 0.60
SCHEMBL210496 0.60
Iodide SCHEMBL8898355 0.57
Formaldehyde SCHEMBL1899503 0.57
Formaldehyde SCHEMBL9617332 0.57 ALDH1A1 (0.36)
SCHEMBL15547959 0.53 TDP1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109134720-B External electron donors for olefin polymerization 印度石油有限公司 2021-03-05 CN claimed
CN-112745408-A Bimodal polyethylene resin for extrusion blow molding of small hollow articles, preparation method and application thereof 中国石油化工股份有限公司 2021-05-04 CN disclosed
CN-112724301-A Polyethylene resin, preparation method thereof and injection blow molding hollow product thereof 中国石油化工股份有限公司 2021-04-30 CN disclosed
CN-109134720-B External electron donors for olefin polymerization 印度石油有限公司 2021-03-05 CN disclosed
US-7320852-B2 Carrier for developer for developing electrostatic latent image, developer using same and image forming method using same RICOH COMPANY, LTD. (JP) 2008-01-22 US disclosed
US-20030224279-A1 Carrier for developer for developing electrostatic latent image, developer using same and image forming method using same RICOH COMPANY, LTD. (JP) 2003-12-04 US disclosed