Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 2/20 | 0.77 |
| ▸ | CES1 | P23141 | 2/20 | 0.77 |
| ▸ | LMNA | P02545 | 3/20 | 0.68 |
| ▸ | ELANE | P08246 | 3/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.68 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.68 |
| ▸ | HPGD | P15428 | 2/20 | 0.68 |
| ▸ | MAPT | P10636 | 2/20 | 0.68 |
| ▸ | RAB9A | P51151 | 2/20 | 0.68 |
| ▸ | MEN1 | O00255 | 1/20 | 0.68 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.68 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.68 |
| ▸ | CA1 | P00915 | 1/20 | 0.65 |
| ▸ | CA2 | P00918 | 1/20 | 0.65 |
| ▸ | ACHE | P22303 | 1/20 | 0.65 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.61 |
| ▸ | GAA | P10253 | 2/20 | 0.61 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.61 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzophenone SCHEMBL27935236 | 1.00 | CES2 (0.77) | CES2CES1LMNAELANEKMT2A | |
| SCHEMBL6618691 | 1.00 | CES2 (0.77) | CES2CES1LMNAELANEKMT2A | |
| Hydrochloric Acid SCHEMBL4595086 | 0.98 | CES2 (0.74) | CES2CES1LMNAELANEKMT2A | |
| SCHEMBL28888786 | 0.98 | CES2 (0.74) | CES2CES1LMNAELANEKMT2A | |
| Hydrochloric Acid SCHEMBL4595093 | 0.98 | CES2 (0.74) | CES2CES1LMNAELANEKMT2A | |
| SCHEMBL28393149 | 0.98 | CES2 (0.74) | CES2CES1LMNAELANEKMT2A | |
| Ethyne SCHEMBL8192853 | 0.96 | CES2 (0.71) | CES2CES1LMNAELANEKMT2A | |
| SCHEMBL28728499 | 0.96 | CES2 (0.71) | CES2CES1LMNAELANEKMT2A | |
| Dimethylamine SCHEMBL9508688 | 0.94 | CES2 (0.69) | CES2CES1LMNAELANEKMT2A | |
| SCHEMBL2998614 | 0.94 | CES2 (0.69) | CES2CES1LMNAELANEKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4589 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4735958-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | Illumina, Inc. (US) | 2026-05-06 | — | — | EP | claimed |
| US-12472185-B2 | Methods for killing antibiotic tolerant bacteria | THE PENN STATE RESEARCH FOUNDATION (US) | 2025-11-18 | — | — | US | claimed |
| CN-120004826-A | Method for preparing organic thioether compound by utilizing photocatalysis | 南京工业大学 | 2025-05-16 | — | — | CN | claimed |
| CN-119930666-A | Doped red organic room-temperature phosphorescent material based on red phosphorescent emitter and preparation method thereof | 江西科技师范大学 | 2025-05-06 | — | — | CN | claimed |
| CN-114829841-B | Temperature warning indicator for hand held lighter | 法国比克公司 | 2025-03-18 | — | — | CN | claimed |
| CN-116789571-B | Preparation method of ultraviolet absorber | 黄冈美丰化工科技有限公司 | 2025-02-28 | — | — | CN | claimed |
| CN-119143721-B | Multi-stimulus response aggregation-induced emission molecule and preparation method thereof | 广东省农业科学院动物科学研究所 | 2025-01-14 | — | — | CN | claimed |
| US-20250010291-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. | 2025-01-09 | — | — | US | claimed |
| WO-2025006431-A1 | PHOTORESIST PATTERNING IN MULTI-DEPTH NANOWELLS | ILLUMINA, INC. (US) | 2025-01-02 | — | — | WO | claimed |
| CN-119143721-A | Multi-stimulus response aggregation-induced emission molecule and preparation method thereof | 广东省农业科学院动物科学研究所 | 2024-12-17 | — | — | CN | claimed |
| US-4510410-A | UNSATURATED POLYMERS AND PHOTOINITIATORS; AUTOMATIC MASS PRODUCTION | HITACHI, LTD. (JP) | 1985-04-09 | — | — | US | claimed |
| EP-0043480-B1 | PROCESS FOR FORMING METALLIC IMAGES | Hitachi, Ltd. (JP) | 1985-04-03 | — | — | EP | claimed |
| US-4494825-A | Fill port seal with first and second photosensitizers | HITACHI, LTD. (JP) | 1985-01-22 | — | — | US | claimed |
| US-4347304-A | PHOTOSENSITIZATION WITH DISILANES OR ORGANIC COMPOUNDS HAVING COUPLED GERMANIUM OR TIN MOLECULES; PHOTORESISTS; POSITIVES; PLATING | HITACHI, LTD. (JP) | 1982-08-31 | — | — | US | claimed |
| EP-0043480-A2 | Process for forming metallic images | Hitachi, Ltd. (JP) | 1982-01-13 | — | — | EP | claimed |
| US-4272586-A | HAVING A BONDING LAYER OF A PHOTOCURED MIXTURE OF A POLYENE, A POLYTHIOL, A PHOTOINIATOR, AND A SILICON-CONTAINING ANCHORING AGENT; OPTICAL LENSES; CARS | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1981-06-09 | — | — | US | claimed |
| US-4208005-A | Method for mounting parts on circuit boards | HITACHI, LTD. (JP) | 1980-06-17 | — | — | US | claimed |
| US-4130586-A | Process for producing imine compounds | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1978-12-19 | — | — | US | claimed |
| US-4083869-A | REACTING BENZOPHENONE WITH AMMONIA IN PRESENCE OF METAL OXIDE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JA) | 1978-04-11 | — | — | US | claimed |
| US-4048036-A | CURING, PHOTOINITIATOR | PPG INDUSTRIES, INC. (US) | 1977-09-13 | — | — | US | claimed |