Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28655050 | 0.93 | TSHR (0.34) | TSHRHPGD | |
| SCHEMBL12902857 | 0.86 | TSHR (0.33) | TSHRHPGD | |
| SCHEMBL28511815 | 0.86 | TSHR (0.38) | TSHRHPGDTHRB | |
| SCHEMBL28518190 | 0.83 | TSHR (0.43) | TSHRHPGDALDH1A1CYP3A4THRB | |
| SCHEMBL674234 | 0.82 | TSHR (0.39) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL680647 | 0.79 | TSHR (0.37) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL28817064 | 0.78 | TSHR (0.46) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL685579 | 0.78 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL525794 | 0.78 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL685575 | 0.78 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | claimed |
| CN-116874659-A | Low-temperature secondary photo-curing grafting oligomer and photosensitive resin composition containing same | 深圳市安云鑫新材料科技有限公司 | 2023-10-13 | — | — | CN | claimed |
| CN-112241107-A | Positive photosensitive resin composition, photosensitive resin film, and display device using same | 株式会社东进世美肯 | 2021-01-19 | — | — | CN | claimed |
| CN-112241107-B | Positive photosensitive resin composition, photosensitive resin film and display device using the same | 株式会社东进世美肯 | 2025-03-11 | — | — | CN | disclosed |
| CN-113646698-B | Photoresist composition and cured product thereof | 太阳控股株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117850164-A | Curable resin composition, dry film, cured product, and printed wiring board | 太阳控股株式会社 | 2024-04-09 | — | — | CN | disclosed |
| CN-114341677-B | Infrared cut filter, filter for solid-state imaging element, and method for manufacturing filter for solid-state imaging element | 凸版印刷株式会社 | 2024-03-05 | — | — | CN | disclosed |
| CN-112334505-B | Dispersing agent composition, coloring composition and color filter | 大塚化学株式会社 | 2024-02-09 | — | — | CN | disclosed |
| CN-117222705-A | Thermosetting composition, method for producing molded article using same, and cured article | 出光兴产株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-117178003-A | Thermosetting composition for injection molding, method for producing molded article using the composition, and cured article | 出光兴产株式会社 | 2023-12-05 | — | — | CN | disclosed |
| CN-117120551-A | Thermosetting resin composition, dry film, cured product, printed wiring board, and electric/electronic component | 太阳控股株式会社 | 2023-11-24 | — | — | CN | disclosed |
| WO-2008128209-A1 | POLYFUNCTIONAL EPOXY OLIGOMERS | DESIGNER MOLECULES, INC. (US) | 2008-10-23 | — | — | WO | disclosed |
| CN-1214717-A | Coating composition comprising bicyclo- or spiro-orthoester-functional compound | AKZO NOBEL NV (NL) | 1999-04-21 | — | — | CN | disclosed |
| EP-0000723-B1 | POLYHYDROXY COMPOUNDS CONTAINING URETHANE-ARYL-SULFONIC ACID-HYDROXYALKYL ESTER GROUPS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS REACTION COMPONENTS FOR THE PREPARATION OF POLYURETHANE RESINS | BAYER AG (DE) | 1981-01-07 | — | — | EP | disclosed |
| US-4237250-A | Polyurethanes containing aryl sulfonic acid alkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-12-02 | — | — | US | disclosed |
| US-4211850-A | Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-07-08 | — | — | US | disclosed |
| US-4201852-A | Polyurethanes based on modified polyisocyanates containing sulphonic acid ester groups and process for the production thereof | BAYER AKTIENGESELLSCHAFT (DE) | 1980-05-06 | — | — | US | disclosed |
| US-4189562-A | Polyhydroxy compounds containing urethane aryl sulfonic acid hydroxyalkyl ester groups | BAYER AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| EP-0000722-A1 | Process for the preparation of polyurethanes containing arylsulfonic acid alkyl ester groups | BAYER AG (DE) | 1979-02-21 | — | — | EP | disclosed |
| EP-0000723-A1 | Polyhydroxy compounds containing urethane-aryl-sulfonic acid-hydroxyalkyl ester groups, process for their preparation and their use as reaction components for the preparation of polyurethane resins | BAYER AG (DE) | 1979-02-21 | — | — | EP | disclosed |