Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.32 |
| ▸ | TP53 | P04637 | 2/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685579 | 0.98 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL6908304 | 0.98 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL685575 | 0.98 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL525794 | 0.98 | TSHR (0.36) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL674234 | 0.92 | TSHR (0.39) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL2938659 | 0.85 | TSHR (0.39) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL10887530 | 0.85 | THRB (0.33) | TSHRALDH1A1THRB | |
| SCHEMBL18940872 | 0.84 | HCAR2 (0.33) | — | |
| SCHEMBL22772602 | 0.84 | TSHR (0.34) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL18940867 | 0.84 | HCAR2 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 581 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118853024-A | High-nickel ternary positive electrode binder and preparation method and application thereof | 深圳大学 | 2024-10-29 | — | — | CN | claimed |
| CN-118125858-A | Porous ceramic for hydrogen determination probe and preparation method thereof | 湖南瓷感科技有限公司 | 2024-06-04 | — | — | CN | claimed |
| CN-112679653-B | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-09-14 | — | — | CN | claimed |
| CN-112679653-A | Photoresist film-forming resin and preparation method of photoresist composition thereof | 甘肃华隆芯材料科技有限公司 | 2021-04-20 | — | — | CN | claimed |
| EP-4112676-B1 | METHOD FOR PRODUCING NITRILE RUBBER | ZEON CORP (JP) | 2026-02-18 | — | — | EP | disclosed |
| EP-3904430-B1 | METHOD FOR RECYCLING NITRILE RUBBER | ZEON CORP (JP) | 2025-12-03 | — | — | EP | disclosed |
| US-12404350-B2 | Method for producing nitrile rubber | ZEON CORPORATION (JP) | 2025-09-02 | — | — | US | disclosed |
| EP-4588988-A1 | REACTIVE ADHESIVE TAPE, REACTIVE ADHESIVE TAPE SYSTEM, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| EP-4588985-A1 | REACTIVE ADHESIVE TAPE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| US-12351716-B2 | Method for recycling nitrile rubber | ZEON CORPORATION (JP) | 2025-07-08 | — | — | US | disclosed |
| WO-2025132698-A1 | METHOD FOR PRODUCING A MULTI-PHASE POLYMER SYSTEM | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| WO-2025132700-A1 | PRESSURE-SENSITIVE ADHESIVE COMPOSITION | TESA SE (DE) | 2025-06-26 | — | — | WO | disclosed |
| EP-1586594-A1 | ACRYLIC COPOLYMER AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2005-10-19 | — | — | EP | disclosed |
| US-20050214676-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-09-29 | — | — | US | disclosed |
| US-6878501-B2 | Fluorinated cyclolefin polymers; radiation transparent, alkali solubility | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-12 | — | — | US | disclosed |
| US-20050053861-A1 | Onium salt compound and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-03-10 | — | — | US | disclosed |
| US-20040176630-A1 | Alicyclic methacrylate having oxygen substituent group on alpha-methyl | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-09-09 | — | — | US | disclosed |
| US-6677419-B1 | REACTING STOICHIOMETRIC EXCESS OF UNSATURATED ALICYCLIC MONOMER WITH ANOTHER UNSATURATED MONOMER, HAVING LESS THAN TWO ELECTRON-WITHDRAWING GROUPS APPENDED TO UNSATURATION, IN PRESENCE OF FREE RADICAL INITIATOR | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-01-13 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040176630-A1 | Alicyclic methacrylate having oxygen substituent group on alpha-methyl | DNMT3A, DNMT1, KDM2A | TSHR 4782/4885HPGD 4395/4885ALDH1A1 893/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.