Hydrochloric Acid

Hydrochloric Acid

SCHEMBL5029036

[Al+3].[Cl-].[Cl-].[Cl-].[N]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114709005-A Silver paste for flexible transparent conductive film metal grid, preparation method and application thereof 深圳市百柔新材料技术有限公司 2022-07-05 CN claimed
US-5034541-A Method of preparing 1-phenyl-1-diethylaminocarbonyl-2-phthalimidomethyl-cyclopropane-z PIERRE FABRE MEDICAMENT (FR) 1991-07-23 US claimed
CN-114709005-A Silver paste for flexible transparent conductive film metal grid, preparation method and application thereof 深圳市百柔新材料技术有限公司 2022-07-05 CN disclosed
CN-103917550-B For the method preparing tenofovir 劳拉斯实验室私人有限公司 2016-08-24 CN disclosed
CN-105347572-A Automobile wastewater circulating treatment system and automobile wastewater circulating treatment method ZHONG XIAOYONG 2016-02-24 CN disclosed
CN-103917550-A Process for preparation of tenofovir LAURUS LABS PRIVATE LTD 2014-07-09 CN disclosed
US-20080083970-A1 Method and materials for growing III-nitride semiconductor compounds containing aluminum JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2008-04-10 US disclosed
WO-2007133512-A2 METHODS AND MATERIALS FOR GROWING III-NITRIDE SEMICONDUCTOR COMPOUNDS CONTAINING ALUMINUM THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2007-11-22 WO disclosed
WO-1997036322-A1 METHODS AND APPARATUS FOR MINIMIZING ETCH RATE LOADING LAM RESEARCH CORPORATION (US) 1997-10-02 WO disclosed
US-5034541-A Method of preparing 1-phenyl-1-diethylaminocarbonyl-2-phthalimidomethyl-cyclopropane-z PIERRE FABRE MEDICAMENT (FR) 1991-07-23 US disclosed
US-4925963-A Process for reduction of organosilicon halides ETHYL CORPORATION (US) 1990-05-15 US disclosed