SCHEMBL503351

SCHEMBL503351

Cc1cc(C2=CCC(c3ccc(O)cc3)CC2)ccc1O

nearest known ligand 0.44

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 14/20 0.44
HSD17B1 P14061 2/20 0.38
HSD17B2 P37059 2/20 0.38
ESR1 P03372 2/20 0.35
TLR8 Q9NR97 1/20 0.35
QDPR P09417 2/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C19 P33261 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3811731 0.86 ESR2 (0.43) ESR2ESR1QDPRCYP3A4
SCHEMBL2721633 0.85 ESR2 (0.57) ESR2ESR1QDPRCYP3A4
SCHEMBL3811773 0.84 ESR2 (0.43) ESR2ESR1QDPRCYP3A4
SCHEMBL3816901 0.83 ALDH1A1 (0.43) ESR2ESR1QDPR
SCHEMBL2719243 0.83 ESR2 (0.45) ESR2HSD17B1ESR1CYP3A4
SCHEMBL3808060 0.81 ESR2 (0.43) ESR2ESR1CYP3A4
SCHEMBL3807529 0.81 ESR2 (0.40) ESR2ESR1CYP3A4CYP2D6CYP2C19
SCHEMBL4214250 0.81 ESR2 (0.42) ESR2ESR1CYP3A4CYP2D6
SCHEMBL4215962 0.81 ESR2 (0.42) ESR2ESR1CYP3A4CYP2D6
SCHEMBL27849741 0.81 ESR2 (0.45) ESR2HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118339201-A Vinyl compound, method for producing vinyl compound, vinyl composition, vinyl resin cured product, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and printed wiring board 住友化学株式会社 2024-07-12 CN disclosed
WO-2023106052-A1 VINYL COMPOUND, METHOD FOR PRODUCING VINYL COMPOUND, VINYL COMPOSITION, VINYL RESIN CURED PRODUCT, PREPREG, FILM WITH RESIN, METAL FOIL WITH RESIN, METAL-CLAD LAMINATE AND PRINTED WIRING BOARD 住友化学株式会社 2023-06-15 WO disclosed
US-20200216324-A1 COMPLEX OF LAMELLAR INORGANIC COMPOUND AND ORGANIC COMPOUND AND METHOD OF PRODUCING THEREOF, DELAMINATED LAMELLAR INORGANIC COMPOUND AND METHOD OF PRODUCING THEREOF, INSULATING RESIN COMPOSITION, RESIN SHEET, INSULATOR, RESIN SHEET CURED PRODUCT, AND HEAT DISSIPATING MEMBER HITACHI CHEMICAL COMPANY, LTD. 2020-07-09 US disclosed
WO-2019031178-A1 RESIN COMPOSITION, CURED PRODUCT, SINGLE-LAYER RESIN SHEET, LAMINATED RESIN SHEET, PREPREG, METAL-FOILED LAMINATE SHEET, PRINTED CIRCUIT BOARD, SEALING MATERIAL, FIBER REINFORCED COMPOSITE MATERIAL, AND ADHESIVE AGENT 三菱瓦斯化学株式会社 2019-02-14 WO disclosed
US-20180044191-A1 COMPLEX OF LAMELLAR INORGANIC COMPOUND AND ORGANIC COMPOUND AND METHOD OF PRODUCING THEREOF, DELAMINATED LAMELLAR INORGANIC COMPOUND AND METHOD OF PRODUCING THEREOF, INSULATING RESIN COMPOSITION, RESIN SHEET, INSULATOR, RESIN SHEET CURED PRODUCT, AND HEAT DISSIPATING MEMBER HITACHI CHEMICAL COMPANY, LTD. (JP) 2018-02-15 US disclosed
EP-3266745-A1 COMPLEX BETWEEN LAMELLAR INORGANIC COMPOUND AND ORGANIC COMPOUND AND METHOD FOR PRODUCING SAME, EXFOLIATED LAMELLAR INORGANIC COMPOUND AND METHOD FOR PRODUCING SAME, INSULATING RESIN COMPOSITION, RESIN SHEET, INSULATOR, RESIN SHEET CURED ARTICLE, AND THERMAL DISSIPATION MEMBER Hitachi Chemical Company, Ltd. (JP) 2018-01-10 EP disclosed
CN-107406263-A The complex and its manufacture method of layered inorganic compound and organic compound, the layered inorganic compound of strippedization and its manufacture method, insulating resin composition, resin sheet, insulant, resin sheet solidfied material and radiating component 日立化成株式会社 2017-11-28 CN disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-9310681-B2 Negative resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
US-20150198883-A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-07-16 US disclosed
US-20090018355-A1 Process for Crystallizing an Epoxy Compound SUMITOMO CHEMICAL COMPANY, LTD. 2009-01-15 US disclosed
US-20090018355-A1 Process for Crystallizing an Epoxy Compound SUMITOMO CHEMICAL COMPANY, LTD. 2009-01-15 US disclosed
US-20090018355-A1 Process for Crystallizing an Epoxy Compound SUMITOMO CHEMICAL COMPANY, LTD. 2009-01-15 US disclosed
EP-1995245-A1 METHOD FOR PRODUCING EPOXY COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-11-26 EP disclosed
EP-1995244-A1 METHOD FOR CRYSTALLIZATION OF EPOXY COMPOUND Sumitomo Chemical Company, Limited (JP) 2008-11-26 EP disclosed
US-20070184280-A1 Epoxy compounds and cured epoxy resins obtained by curing the compounds HITACHI, LTD. (JP) 2007-08-09 US disclosed
EP-1698625-A1 EPOXY COMPOUNDS AND CURED EPOXY RESINS OBTAINED BY CURING THE COMPOUNDS Sumitomo Chemical Company, Limited (JP) 2006-09-06 EP disclosed
US-6872858-B2 Diphenol and process for producing the same HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2005-03-29 US disclosed
US-20040049086-A1 Diphenol and process for producing the same HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2004-03-11 US disclosed
EP-1375461-A1 DIPHENOL AND PROCESS FOR PRODUCING THE SAME Honshu Chemical Industry Co. Ltd. (JP) 2004-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090018355-A1 Process for Crystallizing an Epoxy Compound PTGER1, NR5A1, TCP1 ESR2 8/4885HSD17B1 149/4885HSD17B2 125/4885
US-20040049086-A1 Diphenol and process for producing the same CYP1A1, AHR, CYP2E1 ESR2 940/4885HSD17B1 65/4885HSD17B2 139/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.