SCHEMBL5034235

SCHEMBL5034235

CCCCC(CC)COCC1OCC1CC

nearest known ligand 0.66

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.66
CYP3A4 P08684 5/20 0.43
L3MBTL1 Q9Y468 1/20 0.38
TSHR P16473 3/20 0.36
TDP1 Q9NUW8 3/20 0.36
ATM Q13315 1/20 0.36
MMP9 P14780 1/20 0.35
MMP8 P22894 1/20 0.35
MMP14 P50281 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.33
CA2 P00918 1/20 0.32
RECQL P46063 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21359916 0.88 ALDH1A1 (0.66) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL18529168 0.80 ALDH1A1 (0.62) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL18529129 0.80 ALDH1A1 (0.62) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977802 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977820 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977823 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977814 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977818 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL38306 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1
SCHEMBL12977821 0.80 ALDH1A1 (1.00) ALDH1A1CYP3A4L3MBTL1TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12488909-B2 Oxygen and moisture barrier compositions and related methods UNIVERSITY OF MASSACHUSETTS (US) 2025-12-02 US disclosed
US-20240242854-A1 OXYGEN AND MOISTURE BARRIER COMPOSITIONS AND RELATED METHODS US GOVERNMENT AS REPRESENTED BY THE SECRETARY OF THE ARMY 2024-07-18 US disclosed
US-20170158812-A1 MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME DAICEL CORPORATION (JP) 2017-06-08 US disclosed
US-9134610-B2 Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-09-15 US disclosed
US-20130189850-A1 RESIST UNDERLAYER COATING FORMING COMPOSITION FOR FORMING PHOTO-CROSSLINKING CURED RESIST UNDERLAYER COATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-07-25 US disclosed
EP-1879070-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION FOR FORMING PHOTOCROSSLINKING CURED RESIST UNDERLAYER FILM Nissan Chemical Industries, Ltd. (JP) 2008-01-16 EP disclosed