SCHEMBL5034820

SCHEMBL5034820

C=Cc1ccc(C(=O)Nc2ccccc2O)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 5/20 0.64
MEN1 O00255 3/20 0.64
KMT2A Q03164 3/20 0.64
RAB9A P51151 3/20 0.64
TP53 P04637 2/20 0.64
HDAC2 Q92769 1/20 0.53
LMNA P02545 1/20 0.53
GAA P10253 1/20 0.53
HTT P42858 1/20 0.53
TOP1 P11387 2/20 0.50
TERT O14746 1/20 0.50
APP P05067 1/20 0.50
HDAC1 Q13547 1/20 0.49
POLB P06746 1/20 0.49
MMP1 P03956 3/20 0.48
MMP2 P08253 3/20 0.48
MMP9 P14780 3/20 0.48
TOP2A P11388 1/20 0.47
TOP2B Q02880 1/20 0.47
METAP2 P50579 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6029925 0.86 NPC1 (0.82) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL4061093 0.85 NPC1 (0.66) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL14075504 0.83 HDAC1 (0.68) NPC1RAB9AHDAC2HDAC1
SCHEMBL3282351 0.82 HDAC2 (0.45) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL3661213 0.81 NPC1 (0.74) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL13988325 0.81 NPC1 (0.56) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL4946074 0.81 NPC1 (0.73) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL1470784 0.81 NPC1 (0.73) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL7598925 0.80 CA1 (0.51) NPC1MEN1KMT2ARAB9ATP53
SCHEMBL308111 0.80 NPC1 (0.72) NPC1MEN1KMT2ARAB9ATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed