Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 1.00 |
| ▸ | CYP2C19 | P33261 | 2/20 | 1.00 |
| ▸ | HIF1A | Q16665 | 2/20 | 1.00 |
| ▸ | CYP2D6 | P10635 | 1/20 | 1.00 |
| ▸ | HMGCR | P04035 | 1/20 | 0.55 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.55 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.55 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.48 |
| ▸ | CPT2 | P23786 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ACLY | P53396 | 3/20 | 0.39 |
| ▸ | TET2 | Q6N021 | 1/20 | 0.37 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29020108 | 0.97 | TSHR (0.94) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL14867210 | 0.86 | CYP2C19 (0.75) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL9715119 | 0.86 | CYP2C19 (0.75) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL503894 | 0.86 | CYP2C19 (0.75) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL11305042 | 0.84 | CYP2C19 (0.71) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL2233437 | 0.82 | CYP2C19 (0.68) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL27539128 | 0.82 | HIF1A (0.68) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL17092536 | 0.80 | TSHR (0.64) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL10012423 | 0.80 | CYP2C19 (0.65) | TSHRCYP2C19HIF1ACYP2D6HMGCR | |
| SCHEMBL9886625 | 0.80 | CYP2C19 (0.65) | TSHRCYP2C19HIF1ACYP2D6HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 385 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12637616-B2 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | VERSUM MATERIALS US, LLC (US) | 2026-05-26 | — | — | US | claimed |
| CN-118830064-A | Treatment fluid and method of use thereof | 日本化药株式会社 | 2024-10-22 | — | — | CN | claimed |
| EP-3684887-B1 | ETCHING SOLUTION FOR SIMULTANEOUSLY REMOVING SILICON AND SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2024-09-25 | — | — | EP | claimed |
| US-20240271040-A1 | Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor Device | VERSUM MATERIALS US, LLC | 2024-08-15 | — | — | US | claimed |
| CN-117616102-A | Etching solution for selectively removing silicon-germanium alloy from silicon-germanium/silicon stack during semiconductor device fabrication | 弗萨姆材料美国有限责任公司 | 2024-02-27 | — | — | CN | claimed |
| EP-4323470-A1 | ETCHING SOLUTION FOR SELECTIVELY REMOVING SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/ SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | Versum Materials US, LLC (US) | 2024-02-21 | — | — | EP | claimed |
| WO-2023176642-A1 | TREATMENT LIQUID AND METHOD FOR USING SAME | 日本化薬株式会社 | 2023-09-21 | — | — | WO | claimed |
| EP-3447791-B1 | ETCHING SOLUTION FOR SELECTIVELY REMOVING SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/ SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE | VERSUM MAT US LLC (US) | 2023-07-26 | — | — | EP | claimed |
| CN-116426205-A | Preparation method of high-hardness water-based paint | 几何智慧城市科技(广州)有限公司 | 2023-07-14 | — | — | CN | claimed |
| US-20230002676-A1 | TREATMENT LIQUID AND TREATMENT LIQUID CONTAINER | FUJIFILM CORPORATION (JP) | 2023-01-05 | — | — | US | claimed |
| EP-1501916-B1 | NON-CORROSIVE CLEANING COMPOSITIONS FOR REMOVING ETCH RESIDUES | FUJIFILM ELECTRONIC MATERIALS (US) | 2009-06-17 | — | — | EP | claimed |
| EP-1501916-A4 | NON-CORROSIVE CLEANING COMPOSITIONS FOR REMOVING ETCH RESIDUES | ARCH SPEC CHEM INC (US) | 2005-09-14 | — | — | EP | claimed |
| EP-1501916-A1 | NON-CORROSIVE CLEANING COMPOSITIONS FOR REMOVING ETCH RESIDUES | Arch Specialty Chemicals, Inc. (US) | 2005-02-02 | — | — | EP | claimed |
| US-20030235996-A1 | Non-corrosive cleaning compositions for removing etch residues | ARCH SPECIALTY CHEMICALS, INC. | 2003-12-25 | — | — | US | claimed |
| WO-2003091377-A1 | NON-CORROSIVE CLEANING COMPOSITIONS FOR REMOVING ETCH RESIDUES | ARCH SPECIALITY CHEMICALS, INC. (US) | 2003-11-06 | — | — | WO | claimed |
| EP-0852009-B1 | BUFFER COMPOSITION FOR REAGENTS FOR IMMUNOASSAY | ABBOTT LAB (US) | 2002-08-28 | — | — | EP | claimed |
| EP-0852009-A1 | BUFFER COMPOSITION FOR REAGENTS FOR IMMUNOASSAY | Abbott Laboratories (US) | 1998-07-08 | — | — | EP | claimed |
| US-5773212-A | INCLUDES DITHIOTHREITOL AND ETHYLENE GLYCOL | ABBOTT LABORATORIES (US) | 1998-06-30 | — | — | US | claimed |
| US-5616460-A | AQUEOUS SOLUTION OF DITHIOTHREITOL AND ETHYLENE GLYCOL | ABBOTT LABORATORIES (US) | 1997-04-01 | — | — | US | claimed |
| WO-1996041164-A1 | BUFFER COMPOSITION FOR REAGENTS FOR IMMUNOASSAY | ABBOTT LABORATORIES (US) | 1996-12-19 | — | — | WO | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637616-B2 | Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device | KCNH3, F7, KCNH2 | TSHR 320/4885CYP2C19 3189/4885HIF1A 997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.