SCHEMBL503850

SCHEMBL503850

C[C](C)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.31
TSHR P16473 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL503319 0.82 KDM4E (0.38) KDM4ETSHRTDP1
SCHEMBL4230601 0.79 KDM4E (0.30) KDM4ETSHRTDP1
SCHEMBL811372 0.77 KDM4E (0.33) KDM4ETSHRTDP1
SCHEMBL18759556 0.75
SCHEMBL18759557 0.75
SCHEMBL501614 0.71 KDM4E (0.32) KDM4ETSHRTDP1
SCHEMBL892346 0.69 KDM4E (0.36) KDM4ETSHRTDP1
SCHEMBL8737960 0.67 KDM4E (0.35) KDM4ETSHRTDP1
SCHEMBL6338465 0.67 KDM4E (0.40) KDM4ETSHRTDP1
SCHEMBL14519850 0.67 KDM4E (0.31) KDM4ETSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116034147-B Adhesive composition containing antistatic agent and surface protective film 株式会社LG化学 2024-04-05 CN claimed
US-20240010875-A1 ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2024-01-11 US claimed
US-20230323171-A1 ADHESIVE COMPOSITION CONTAINING ANTISTATIC AGENT AND SURFACE PROTECTIVE FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2023-10-12 US claimed
EP-4190877-A1 ADHESIVE COMPOSITION CONTAINING ANTISTATIC AGENT AND SURFACE PROTECTIVE FILM Lg Chem, Ltd. (KR) 2023-06-07 EP claimed
CN-116034147-A Adhesive composition containing antistatic agent and surface protective film 株式会社LG化学 2023-04-28 CN claimed
EP-4130188-A1 ADHESIVE COMPOSITION AND SURFACE PROTECTIVE FILM Lg Chem, Ltd. (KR) 2023-02-08 EP claimed
CN-116034147-B Adhesive composition containing antistatic agent and surface protective film 株式会社LG化学 2024-04-05 CN disclosed
US-20240010875-A1 ADHESIVE COMPOSITION AND SURFACE PROTECTION FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2024-01-11 US disclosed
WO-2023238764-A1 COMPOSITION, FILM, ORGANIC PHOTOELECTRIC CONVERSION ELEMENT, AND PHOTODETECTION ELEMENT 住友化学株式会社 2023-12-14 WO disclosed
US-20230323171-A1 ADHESIVE COMPOSITION CONTAINING ANTISTATIC AGENT AND SURFACE PROTECTIVE FILM XINMEI FONTANA HOLDING (HONG KONG) LIMITED (CN) 2023-10-12 US disclosed
EP-4190877-A1 ADHESIVE COMPOSITION CONTAINING ANTISTATIC AGENT AND SURFACE PROTECTIVE FILM Lg Chem, Ltd. (KR) 2023-06-07 EP disclosed
CN-116034147-A Adhesive composition containing antistatic agent and surface protective film 株式会社LG化学 2023-04-28 CN disclosed
WO-2023068316-A1 MATERIAL FOR SOFT CONTACT LENS HAVING CONTRAST IMPROVEMENT FUNCTION 興和株式会社 2023-04-27 WO disclosed
US-20080038661-A1 Copolymer and Top Coating Composition JSR CORPORATION (JP) 2008-02-14 US disclosed
EP-1867683-A1 NOVEL POLYMERIZABLE DYE AND OPHTHALMIC LENS CONTAINING THE SAME MENICON CO., LTD. (JP) 2007-12-19 EP disclosed
CN-101080674-A Composition for forming antireflection film, layered product, and method for forming resist pattern JSR CORP (JP) 2007-11-28 CN disclosed
CN-101031597-A Copolymer and composition for forming upper layer film JSR CORP (JP) 2007-09-05 CN disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
EP-1806370-A1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR Corporation (JP) 2007-07-11 EP disclosed
EP-1708027-A1 UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2006-10-04 EP disclosed