SCHEMBL503913

SCHEMBL503913

C[CH]C(F)(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9490446 0.73
SCHEMBL28472563 0.71
SCHEMBL191848 0.71
SCHEMBL9928908 0.69
SCHEMBL1825796 0.67
SCHEMBL1470395 0.67
SCHEMBL513692 0.64
SCHEMBL4338688 0.64
SCHEMBL7630087 0.64
SCHEMBL2002888 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240150312-A1 PYRAZINE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-09 US disclosed
US-11905271-B2 Pyrazine compound SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-02-20 US disclosed
EP-3730494-B1 HETEROCYCLIC COMPOUND AND HARMFUL ARTHROPOD CONTROLLING AGENT CONTAINING SAME SUMITOMO CHEMICAL CO (JP) 2023-11-08 EP disclosed
EP-3483144-B1 HETEROCYCLIC COMPOUND AND HARMFUL ARTHROPOD CONTROLLING AGENT CONTAINING SAME SUMITOMO CHEMICAL CO (JP) 2023-10-11 EP disclosed
CN-110035994-B Heterocyclic compound and harmful arthropod control composition containing same 住友化学株式会社 2022-10-18 CN disclosed
CN-111712497-B Heterocyclic compound and noxious arthropod control agent containing same 住友化学株式会社 2022-10-18 CN disclosed
CN-111164081-B Heterocyclic compound and noxious arthropod control agent containing same 住友化学株式会社 2022-08-12 CN disclosed
CN-109415318-B Heterocyclic compound and harmful arthropod control agent containing same 住友化学株式会社 2022-06-28 CN disclosed
US-11344029-B2 Heterocyclic compound and composition containing same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-31 US disclosed
US-20220135537-A1 ETHER COMPOUND AND HARMFUL ARTHROPOD-CONTROLLING COMPOSITION CONTAINING SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2022-05-05 US disclosed
EP-1950610-A1 COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2008-07-30 EP disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
WO-2008032858-A2 THIADIAZOLE COMPOUND AND USE THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-03-20 WO disclosed
CN-101080674-A Composition for forming antireflection film, layered product, and method for forming resist pattern JSR CORP (JP) 2007-11-28 CN disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
EP-1806370-A1 COPOLYMER AND UPPER FILM-FORMING COMPOSITION JSR Corporation (JP) 2007-07-11 EP disclosed
EP-1708027-A1 UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN JSR Corporation (JP) 2006-10-04 EP disclosed
US-5410005-A Comprising acrylic amide and ester copolymers and their salts, having carboxyl and sulfonic acid groups as well as fluoro JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-04-25 US disclosed
US-5334726-A Controlling weeds ROHM AND HAAS COMPANY (US) 1994-08-02 US disclosed
US-5120347-A Pre and postemergence ROHM AND HAAS COMPANY (US) 1992-06-09 US disclosed