⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1827147 | 0.82 | KDM4E (0.33) | — | |
| SCHEMBL1826302 | 0.80 | KDM4E (0.32) | — | |
| SCHEMBL9323333 | 0.78 | KDM4E (0.31) | — | |
| SCHEMBL4866061 | 0.71 | — | — | |
| SCHEMBL1287907 | 0.69 | — | — | |
| SCHEMBL8091713 | 0.69 | — | — | |
| SCHEMBL892347 | 0.69 | KDM4E (0.31) | — | |
| SCHEMBL503913 | 0.67 | — | — | |
| SCHEMBL333613 | 0.67 | KDM4E (0.35) | — | |
| SCHEMBL199483 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101080674-B | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP | 2013-09-18 | — | — | CN | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |