⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8984823 | 0.81 | CYP2C19 (0.35) | — | |
| SCHEMBL4731405 | 0.77 | — | — | |
| SCHEMBL12622526 | 0.75 | — | — | |
| SCHEMBL28735575 | 0.74 | TSHR (0.39) | — | |
| SCHEMBL21693854 | 0.74 | — | — | |
| SCHEMBL29216811 | 0.74 | — | — | |
| SCHEMBL3912290 | 0.73 | EPHX1 (0.32) | — | |
| SCHEMBL4103637 | 0.73 | EPHX1 (0.32) | — | |
| SCHEMBL28647993 | 0.73 | TSHR (0.40) | — | |
| SCHEMBL687065 | 0.73 | TSHR (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10177328-B2 | Electronic device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2019-01-08 | — | — | US | claimed |
| US-10008605-B2 | Connecting structure and method for manufacturing the same, and semiconductor device | FUJITSU LIMITED (JP) | 2018-06-26 | — | — | US | claimed |
| US-20160104852-A1 | ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2016-04-14 | — | — | US | claimed |
| US-20160027928-A1 | CONNECTING STRUCTURE AND METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2016-01-28 | — | — | US | claimed |
| US-10177328-B2 | Electronic device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2019-01-08 | — | — | US | disclosed |
| US-10008605-B2 | Connecting structure and method for manufacturing the same, and semiconductor device | FUJITSU LIMITED (JP) | 2018-06-26 | — | — | US | disclosed |
| US-20160104852-A1 | ELECTRONIC DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2016-04-14 | — | — | US | disclosed |
| US-20160027928-A1 | CONNECTING STRUCTURE AND METHOD FOR MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2016-01-28 | — | — | US | disclosed |
| EP-1937695-B1 | NOVEL ORGANIC SILANE COMPOUND | LG CHEMICAL LTD (KR) | 2012-08-29 | — | — | EP | disclosed |
| EP-1937695-A1 | NOVEL ORGANIC SILANE COMPOUND | LG Chem, Ltd. (KR) | 2008-07-02 | — | — | EP | disclosed |
| US-7262313-B2 | Organic silane compound | LG CHEM, LTD. (KR) | 2007-08-28 | — | — | US | disclosed |
| US-20070093671-A1 | Organic silane compound | LG CHEM, LTD. (KR) | 2007-04-26 | — | — | US | disclosed |
| WO-2007046646-A1 | NOVEL ORGANIC SILANE COMPOUND | LG CHEM, LTD. (KR) | 2007-04-26 | — | — | WO | disclosed |
| US-6861491-B2 | Method for producing a thermosetting polyurethane from a thermoplastic polyurethane and thermoset polyurethane obtainable using said method | NOVEON IP HOLDINGS CORP. (US) | 2005-03-01 | — | — | US | disclosed |
| EP-1183296-B1 | METHOD FOR PRODUCING THERMOSETTING POLYURETHANE FROM THERMOPLASTIC POLYURETHANE AND THERMOSET POLYURETHANE OBTAINED USING SAID METHOD | NOVEON IP HOLDINGS CORP (US) | 2004-04-28 | — | — | EP | disclosed |
| US-20020169255-A1 | Method for producing a thermosetting polyurethane from a thermoplastic polyurethane and thermoset polyurethane obtainable using said method | GEMOPLAST(SOCIETE ANONYME) (FR) | 2002-11-14 | — | — | US | disclosed |
| EP-1183296-A1 | METHOD FOR PRODUCING THERMOSETTING POLYURETHANE FROM THERMOPLASTIC POLYURETHANE AND THERMOSET POLYURETHANE OBTAINED USING SAID METHOD | Gemoplast Société Anonyme (FR) | 2002-03-06 | — | — | EP | disclosed |
| WO-2000075213-A1 | METHOD FOR PRODUCING THERMOSETTING POLYURETHANE FROM THERMOPLASTIC POLYURETHANE AND THERMOSET POLYURETHANE OBTAINED USING SAID METHOD | GEMOPLAST (SOCIETE ANONYME) (FR) | 2000-12-14 | — | — | WO | disclosed |