SCHEMBL5057263

SCHEMBL5057263

C=CC(=O)NC(C)(C)CCC(=O)O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.51
CYP2C19 P33261 4/20 0.51
CYP3A4 P08684 3/20 0.51
CYP2C9 P11712 3/20 0.51
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
NAALAD2 Q9Y3Q0 1/20 0.44
TSHR P16473 5/20 0.35
TDP1 Q9NUW8 2/20 0.35
MAPK1 P28482 1/20 0.35
CYP2D6 P10635 3/20 0.34
BLM P54132 2/20 0.34
SLC6A2 P23975 1/20 0.34
SLC6A4 P31645 1/20 0.34
SLC6A3 Q01959 1/20 0.34
NFKB1 P19838 1/20 0.34
CYP1A2 P05177 2/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL35674 0.82 ALDH1A1 (0.56) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL736116 0.80 MEN1 (0.53) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
Hydrochloric Acid SCHEMBL7158460 0.80 ALDH1A1 (0.54) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL20467953 0.80 MEN1 (0.53) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL4906709 0.80 KMT2A (0.53) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL9246722 0.80 ALDH1A1 (0.54) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL15448877 0.80 MEN1 (0.53) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL18342489 0.80 ALDH1A1 (0.39) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL27914054 0.80 ALDH1A1 (0.41) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1
SCHEMBL758168 0.79 KMT2A (0.49) ALDH1A1CYP2C19CYP3A4CYP2C9MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080281014-A1 Nanosubstance-Containing Composition, Process for Producing the Same, and Composite Made With the Same MITSUBISHI RAYON CO., LTD. (JP) 2008-11-13 US disclosed