⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30381507 | 1.00 | — | — | |
| SCHEMBL15524264 | 0.87 | — | — | |
| Zinc Ion SCHEMBL36518 | 0.87 | — | — | |
| SCHEMBL15524647 | 0.87 | — | — | |
| SCHEMBL15524180 | 0.87 | — | — | |
| SCHEMBL23610355 | 0.87 | — | — | |
| SCHEMBL350384 | 0.87 | — | — | |
| SCHEMBL1439123 | 0.87 | — | — | |
| SCHEMBL349061 | 0.87 | — | — | |
| SCHEMBL94641 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 20341 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12637772-B2 | Method for crystallization of metal oxide thin film by using thermal dissipation annealing | INJE UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) | 2026-05-26 | — | — | US | claimed |
| US-12641957-B2 | Display device and method of providing the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-05-26 | — | — | US | claimed |
| CN-122028522-A | Photoelectric detector, manufacturing method thereof and spectrometer | 浙江大学杭州国际科创中心 | 2026-05-12 | — | — | CN | claimed |
| US-12628512-B2 | Electronic device | Innolux Corporation (TW) | 2026-05-12 | — | — | US | claimed |
| US-20260130018-A1 | LIGHT-EMITTING DIODE AND LIGHT-EMITTING DEVICE | QUANZHOU SANAN SEMICONDUCTOR TECH CO LTD (CN) | 2026-05-07 | — | — | US | claimed |
| US-12622002-B2 | Semiconductor device including memory cell including thyristor and method of manufacturing the same | SK Hynix Inc. (KR) | 2026-05-05 | — | — | US | claimed |
| US-20260123183-A1 | ELECTRONIC APPARATUS AND METHOD FOR MANUFACTURING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| US-20260123009-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | claimed |
| US-12610525-B2 | Semiconductor structure, method for manufacturing semiconductor structure, memory and method for manufacturing memory | CHANGXIN MEMORY TECHNOLOGIES, INC. (CN) | 2026-04-21 | — | — | US | claimed |
| US-20260107660-A1 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2026-04-16 | — | — | US | claimed |
| US-6297495-B1 | COPPER PHTHALOCYANINE AND PERYLENETETRACARBOXYLIC DIANHYDRIDE PHOTOCONDUCTIVE LAYERS; PHOTOVOLTAIC HETEROJUNCTION | THE TRUSTEES OF PRINCETON UNIVERSITY | 2001-10-02 | — | — | US | claimed |
| EP-1048084-A4 | ORGANIC PHOTOSENSITIVE OPTOELECTRONIC DEVICE | UNIV PRINCETON (US) | 2001-05-09 | — | — | EP | claimed |
| EP-1056596-A1 | PROCESS FOR FORMING ELECTRODES | POLAROID CORPORATION (US) | 2000-12-06 | — | — | EP | claimed |
| EP-1057048-A1 | ANTIREFLECTION FILM | Polaroid Corporation (US) | 2000-12-06 | — | — | EP | claimed |
| EP-1048084-A1 | ORGANIC PHOTOSENSITIVE OPTOELECTRONIC DEVICE | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 2000-11-02 | — | — | EP | claimed |
| US-6114079-A | INCLUDING A SUPPORT, AN IMAGING LAYER SAID SUPPORT, AND A PRINT-RETAINING, ELECTRICALLY-CONDUCTIVE LAYER | EASTMAN KODAK COMPANY (US) | 2000-09-05 | — | — | US | claimed |
| WO-2000011725-A9 | ORGANIC PHOTOSENSITIVE OPTOELECTRONIC DEVICE | UNIV PRINCETON (US) | 2000-08-31 | — | — | WO | claimed |
| WO-2000011725-A1 | ORGANIC PHOTOSENSITIVE OPTOELECTRONIC DEVICE | THE TRUSTEES OF PRINCETON UNIVERSITY (US) | 2000-03-02 | — | — | WO | claimed |
| WO-1999042860-A1 | ANTIREFLECTION FILM | POLAROID CORPORATION (US) | 1999-08-26 | — | — | WO | claimed |
| WO-1999036261-A1 | PROCESS FOR FORMING ELECTRODES | POLAROID CORPORATION (US) | 1999-07-22 | — | — | WO | claimed |