SCHEMBL506587

SCHEMBL506587

CC(C)(C)CC(C)(C)N=CC=NC(C)(C)CC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL984818 1.00
SCHEMBL984815 1.00
SCHEMBL14856677 0.92
SCHEMBL19121731 0.81
SCHEMBL506921 0.71 TSHR (0.35)
SCHEMBL2749956 0.69 TSHR (0.31)
SCHEMBL1100486 0.69 TSHR (0.31)
SCHEMBL124302 0.69 TSHR (0.31)
SCHEMBL124301 0.69 TSHR (0.31)
SCHEMBL1907225 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2754638-B1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX TOSOH CORP (JP) 2018-11-07 EP disclosed
US-9371452-B2 Film-forming material, group IV metal oxide film and vinylenediamide complex TOSOH CORPORATION (JP) 2016-06-21 US disclosed
US-9120825-B2 Hydrosilane derivative, method for producing same, and method for producing silicon-containing thin film TOSOH CORPORATION (JP) 2015-09-01 US disclosed
EP-2581377-B1 HYDROSILANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM TOSOH CORP (JP) 2015-07-29 EP disclosed
US-20140227456-A1 FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2014-08-14 US disclosed
US-8779174-B2 Titanium complex, processes for producing the same, titanium-containing thin film, and process for producing the same TOSOH CORPORATION (JP) 2014-07-15 US disclosed
US-20130123528-A1 HYDROSILANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2013-05-16 US disclosed
EP-2581377-A1 HYDROSILANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM Tosoh Corporation (JP) 2013-04-17 EP disclosed
US-8288602-B2 Synthesis of substituted fluorene ligands TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2012-10-16 US disclosed
US-20120029220-A1 TITANIUM COMPLEX, PROCESSES FOR PRODUCING THE SAME, TITANIUM-CONTAINING THIN FILM, AND PROCESS FOR PRODUCING THE SAME SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) 2012-02-02 US disclosed
US-20110009683-A1 SYNTHESIS OF SUBSTITUTED FLUORENE LIGANDS TOTAL PETROCHEMICALS RESEARCH FELUY (BE) 2011-01-13 US disclosed
EP-1999091-B1 SYNTHESIS OF SUBSTITUTED FLUORENES TOTAL PETROCHEMICALS RES FELUY (BE) 2010-08-04 EP disclosed