SCHEMBL5072141

SCHEMBL5072141

C=C(C)COCC[Si](OCCC)(OCCC)OCCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1068964 0.89 CES2 (0.35)
SCHEMBL393923 0.86
SCHEMBL11766554 0.83
SCHEMBL235468 0.82
SCHEMBL17002613 0.82
SCHEMBL11762256 0.81
SCHEMBL1133077 0.80 CES2 (0.38)
SCHEMBL294859 0.79
SCHEMBL8899377 0.78 CES2 (0.35)
SCHEMBL7643201 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160299376-A1 LIQUID CRYSTAL DISPLAY DEVICE, RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, METHOD FOR PRODUCING INTERLAYER INSULATING FILM, AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE JSR CORPORATION (JP) 2016-10-13 US disclosed
US-20140014928-A1 ORGANIC EL ELEMENT, RADIATION-SENSITIVE RESIN COMPOSITION, AND CURED FILM JSR CORPORATION (JP) 2014-01-16 US disclosed
US-20080249271-A1 Adhesive containing ladder-type polysilsesquioxane and adhesive sheet LINTEC CORPORATION (JP) 2008-10-09 US disclosed
US-4081421-A Curable resin composition for abrasion-resistant coating JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) 1978-03-28 US disclosed
US-4026826-A ALKOXYSILANES JAPAN ATOMIC ENERGY RESEARCH INSTITUTE (JA) 1977-05-31 US disclosed