SCHEMBL5073167

SCHEMBL5073167

CC(=O)Oc1ccc(N2C(=O)C=CC2=O)cc1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GLA P06280 1/20 0.67
MGLL Q99685 8/20 0.61
PTGS1 P23219 1/20 0.56
PTGS2 P35354 1/20 0.56
FAAH O00519 2/20 0.56
ALDH1A1 P00352 4/20 0.55
HPGD P15428 4/20 0.55
HTT P42858 4/20 0.55
NPSR1 Q6W5P4 4/20 0.55
ATM Q13315 4/20 0.55
CACNA1B Q00975 3/20 0.55
APBA1 Q02410 3/20 0.55
LMNA P02545 3/20 0.55
HSD17B10 Q99714 2/20 0.55
MAPK1 P28482 2/20 0.55
MAPT P10636 2/20 0.55
TP53 P04637 1/20 0.55
RAB9A P51151 1/20 0.55
HSP90AA1 P07900 3/20 0.52
PKM P14618 3/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Maleic Anhydride SCHEMBL8722603 0.91 GLA (0.56) GLAMGLLPTGS1PTGS2FAAH
SCHEMBL16721018 0.87 MGLL (0.59) GLAMGLLPTGS1PTGS2FAAH
SCHEMBL11365747 0.85 PTGS1 (0.56) GLAMGLLPTGS1PTGS2FAAH
SCHEMBL16721017 0.85 MGLL (0.60) GLAMGLLFAAHALDH1A1HPGD
SCHEMBL13133153 0.83 KMT2A (0.70) GLAMGLLPTGS1PTGS2FAAH
SCHEMBL10784411 0.82 GLA (0.62) GLAMGLLPTGS1PTGS2FAAH
SCHEMBL11370436 0.81 MGLL (0.56) GLAMGLLFAAHALDH1A1HPGD
SCHEMBL29836551 0.81 MGLL (0.65) MGLLPTGS1PTGS2FAAHALDH1A1
SCHEMBL13133155 0.81 MGLL (0.65) MGLLPTGS1PTGS2FAAHALDH1A1
SCHEMBL12268600 0.80 HSP90AA1 (0.61) MGLLFAAHALDH1A1HPGDHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106950799-B Photosensitive emulsion composition and application thereof in electrochemical-free treatment of thermosensitive CTP (computer to plate) 广东潮新科数字科技有限公司 2020-10-30 CN claimed
WO-2008125787-A1 METHOD FOR PREPARING A CATALYST AND USE THEREOF IN A CONTINUOUS METHOD FOR THE TRANSESTERIFICATION OF (METH)ACRYLIC ESTERS ARKEMA FRANCE (FR) 2008-10-23 WO claimed
EP-0830430-B1 POLYMERS FOR ANTIFOULING COATINGS AND A PROCESS FOR THE PREPARATION THEREOF JOTUN AS (NO) 1999-08-18 EP claimed
US-5821300-A MONOMERS INCLUDE ORGANOTIN-CONTAINING (METH)ACRYLATES AND N-SUBSTITUTED MALEIMIDES WITCO GMBH (DE) 1998-10-13 US claimed
EP-0841353-A1 Process for the preparation of polymeric binders and their application as antifouling paint Witco GmbH (DE) 1998-05-13 EP claimed
EP-0830430-A1 POLYMERS FOR ANTIFOULING COATINGS AND A PROCESS FOR THE PREPARATION THEREOF Jotun A/S (NO) 1998-03-25 EP claimed
WO-1996041841-A1 POLYMERS FOR ANTIFOULING COATINGS AND A PROCESS FOR THE PREPARATION THEREOF JOTUN A/S (NO) 1996-12-27 WO claimed
US-5262500-A IC=integrated circuits; copolymer of N-(4-hydroxyphenyl)maleimide and para-trialkylsilylstyrene TATUNG CO. (TW) 1993-11-16 US claimed
US-4289699-A DISSOLVING CORRESPONSING ESTER IN OXYACID, HYDROLYSIS, PRECIPITATION MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1981-09-15 US claimed
CN-113024726-B Pyrazole blocked isocyanate polymer and positive printing plate containing the same 乐凯华光印刷科技有限公司 2022-09-20 CN disclosed
CN-113234194-B Copolymer, primer composition, double-layer system and application of double-layer system in double-layer stripping process 北京科华微电子材料有限公司 2022-08-12 CN disclosed
CN-109774334-B Positive thermosensitive UV-resistant ink CTP plate 乐凯华光印刷科技有限公司 2021-11-30 CN disclosed
CN-108219058-B UV-resistant ink positive UV-CTP lithographic printing plate material 乐凯华光印刷科技有限公司 2021-10-15 CN disclosed
CN-113234194-A Copolymer, primer composition, double-layer system and application of double-layer system in double-layer stripping process 北京科华微电子材料有限公司 2021-08-10 CN disclosed
EP-0187517-A2 High-temperature resistant, selectively developable resist EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-07-16 EP disclosed
EP-0051687-B1 MALEIMIDES AND PROCESS FOR THE PREPARATION OF SAME MITSUI TOATSU CHEMICALS, Inc. (JP) 1984-05-16 EP disclosed
US-4400521-A RESINS, VARNICHES, CURING AGENTS, LAMINATION, ADHESIVES, HEAT RESISTANCE MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1983-08-23 US disclosed
EP-0051687-A1 Maleimides and process for the preparation of same MITSUI TOATSU CHEMICALS, Inc. (JP) 1982-05-19 EP disclosed
US-4289699-A DISSOLVING CORRESPONSING ESTER IN OXYACID, HYDROLYSIS, PRECIPITATION MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1981-09-15 US disclosed
US-4231934-A TREATING A N-(HYDROXYPHENYL)MALEAMIC ACID WITH A DEHYDRATING AGENT MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1980-11-04 US disclosed