SCHEMBL5076359

SCHEMBL5076359

COc1ccc(-c2[nH]c(-c3ccccc3Cl)nc2-c2ccccc2Cl)cc1OC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TEK Q02763 1/20 0.57
ALDH1A1 P00352 5/20 0.55
TP53 P04637 5/20 0.55
MEN1 O00255 4/20 0.55
KMT2A Q03164 4/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
L3MBTL1 Q9Y468 2/20 0.55
NPC1 O15118 1/20 0.55
TSHR P16473 1/20 0.55
RAB9A P51151 1/20 0.55
MAPT P10636 9/20 0.49
KDM4E B2RXH2 4/20 0.49
LMNA P02545 3/20 0.49
HPGD P15428 3/20 0.49
HTT P42858 2/20 0.49
TDP1 Q9NUW8 2/20 0.49
POLB P06746 1/20 0.49
PPARG P37231 1/20 0.49
NCOA2 Q15596 1/20 0.49
NCOA1 Q15788 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28004199 0.95 TEK (0.64) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL1038907 0.94 TEK (0.58) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL9496039 0.91 TEK (0.59) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL29895756 0.91 TEK (0.59) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL29581646 0.91 TEK (0.59) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL9768433 0.88 NPY5R (0.51) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL16503686 0.86 TEK (0.46) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL10436432 0.85 TEK (0.45) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL27888885 0.85 TEK (0.45) TEKALDH1A1TP53MEN1KMT2A
SCHEMBL28407375 0.83 MAPK13 (0.53) TEKALDH1A1TP53MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180319-B1 APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US claimed
EP-1062546-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DUPONT DE NEMOURS AND COMPANY (US) 2000-12-27 EP claimed
WO-1999046644-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-09-16 WO claimed
EP-0475153-A1 Borate coinitiators for photopolymerizable compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-03-18 EP claimed
EP-0215453-B1 PHOTOIMAGING COMPOSITION CONTAINING ADMIXTURE OF LEUCO DYE AND 2,4,5-TRIPHENYLIMIDAZOLYL DIMER E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-09-13 EP claimed
US-4622286-A Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer E. I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-11 US claimed
EP-1058697-B1 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR DU PONT (US) 2008-11-26 EP disclosed
EP-1058697-A4 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR DU PONT (US) 2002-10-16 EP disclosed
US-20010051689-A1 Polymeric films having controlled viscosity response to temperature and shear FOREMAN THOMAS KEVIN (US) 2001-12-13 US disclosed
US-6180319-B1 APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION E. I. DU PONT DE NEMOURS AND COMPANY 2001-01-30 US disclosed
EP-1062546-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DUPONT DE NEMOURS AND COMPANY (US) 2000-12-27 EP disclosed
EP-1058697-A1 POLYMERIC FILMS HAVING CONTROLLED VISCOSITY RESPONSE TO TEMPERATURE AND SHEAR E.I. DU PONT DE NEMOURS AND COMPANY (US) 2000-12-13 EP disclosed
WO-1999046644-A1 PROCESS FOR THE CONTINUOUS LIQUID PROCESSING OF PHOTOSENSITIVE COMPOSITIONS HAVING REDUCED LEVELS OF RESIDUES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1999-09-16 WO disclosed
US-5332819-A Photobleachable initiator systems E.I. DU PONT DE NEMOURS AND COMPANY (US) 1994-07-26 US disclosed
US-5217846-A Photopolymerizable compostion containing an addition polymerizable unsaturated initiator, a coinitiater and a sensitizer E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-06-08 US disclosed
US-5153100-A Hexaarylbisimidazole and-or p-dialkylaminophenyl carbonyl compound E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-10-06 US disclosed
EP-0483648-A2 Borate coinitiators for photopolymerizable compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-05-06 EP disclosed
EP-0475153-A1 Borate coinitiators for photopolymerizable compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-03-18 EP disclosed
EP-0215453-B1 PHOTOIMAGING COMPOSITION CONTAINING ADMIXTURE OF LEUCO DYE AND 2,4,5-TRIPHENYLIMIDAZOLYL DIMER E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-09-13 EP disclosed
US-4622286-A Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer E. I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-11 US disclosed