SCHEMBL5080076

SCHEMBL5080076

CC(CO)(CO)C(=O)[O-].CC(CO)(CO)C(=O)[O-].CC(CO)(CO)C(=O)[O-].CC(CO)(CO)C(=O)[O-].[Pb+4]

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 1/20 0.32
TSHR P16473 1/20 0.32
CYP2C19 P33261 1/20 0.32
HIF1A Q16665 1/20 0.32
CA2 P00918 1/20 0.32
CA1 P00915 2/20 0.32
CA4 P22748 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL2701663 0.94 CA4 (0.35) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL2031599 0.94 CA2 (0.38) CYP2D6TSHRCYP2C19HIF1ACA2
Zinc Ion SCHEMBL5144410 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL5144685 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL5142314 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL5080079 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL5144808 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
SCHEMBL5165796 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
Lithium Ion SCHEMBL5144788 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2
Silver SCHEMBL979870 0.94 CYP2D6 (0.32) CYP2D6TSHRCYP2C19HIF1ACA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080087864-A1 Stabilizer Composition for Halogenated Polymers MOBISOL INC. (KR) 2008-04-17 US disclosed
EP-0313113-A1 3-Basic lead dimethylolpropionate and stabilizer composition for halogen-containing vinyl polymers containing the same METALLGESELLSCHAFT AG (DE) 1989-04-26 EP disclosed
EP-0313113-A1 3-Basic lead dimethylolpropionate and stabilizer composition for halogen-containing vinyl polymers containing the same METALLGESELLSCHAFT AG (DE) 1989-04-26 EP disclosed