SCHEMBL508298

SCHEMBL508298

Nc1ccc(O)c(-n2nc3ccccc3n2)c1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 9/20 0.65
RAB9A P51151 9/20 0.65
LMNA P02545 1/20 0.65
MEN1 O00255 7/20 0.57
KMT2A Q03164 7/20 0.57
KDM4E B2RXH2 6/20 0.50
MAPT P10636 6/20 0.50
ALDH1A1 P00352 4/20 0.50
CASP1 P29466 3/20 0.50
CASP7 P55210 3/20 0.50
HSD17B10 Q99714 3/20 0.50
HPGD P15428 3/20 0.50
ALOX15 P16050 2/20 0.50
TP53 P04637 2/20 0.50
STAT1 P42224 1/20 0.50
APAF1 O14727 1/20 0.50
POLB P06746 4/20 0.42
GAA P10253 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29444885 1.00 NPC1 (0.65) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL30058950 0.86 NPC1 (0.51) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL3937549 0.86 NPC1 (0.51) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL3217888 0.83 KMT2A (0.63) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL6930071 0.82 MEN1 (0.58) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL7857203 0.81 NPC1 (0.69) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL30337840 0.81 NPC1 (0.69) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL21023563 0.81 MEN1 (0.64) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL21586958 0.81 MEN1 (0.53) NPC1RAB9ALMNAMEN1KMT2A
SCHEMBL21586957 0.80 KMT2A (0.55) NPC1RAB9ALMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114316846-A Glue film composition containing polystyrene microspheres and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2022-04-12 CN claimed
CN-114149769-A High-reflection black adhesive film and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2022-03-08 CN claimed
CN-114149754-A Grid adhesive film and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2022-03-08 CN claimed
CN-113278287-A High durable bridge cut-off aluminium door and window is with heat insulating strip 安徽省天仁地造新材料有限公司 2021-08-20 CN claimed
CN-106601851-B A kind of environment-friendly type photovoltaic back and manufacturing method 中天光伏材料有限公司 2019-07-05 CN claimed
CN-106221594-B A kind of heat discoloration photovoltaic module 中天光伏材料有限公司 2019-04-05 CN claimed
CN-108659336-A A kind of antimildew and antibacterial type photovoltaic back and preparation method thereof 中天光伏材料有限公司 2018-10-16 CN claimed
CN-108346709-A A kind of functionalization polyvinylidene difluoride film of double-layer coextrusion and its preparation method of photovoltaic cell backplane 中天科技精密材料有限公司 2018-07-31 CN claimed
CN-105566818-B Polyvinylidene fluoride film and preparation method thereof 中天科技精密材料有限公司 2018-06-19 CN claimed
CN-106611802-B A kind of E-film for solar back panel material 中天光伏材料有限公司 2018-05-04 CN claimed
CN-104530548-B Halogen-free transparent flame-retardant photovoltaic encapsulating material and preparation method of halogen-free transparent flame-retardant photovoltaic encapsulating material 杭州福斯特光伏材料股份有限公司 2017-02-22 CN claimed
CN-106221594-A A kind of heat discoloration photovoltaic module 中天光伏材料有限公司 2016-12-14 CN claimed
CN-111433637-B Composition for manufacturing an ophthalmic lens comprising an encapsulated light absorbing additive 依视路国际公司 2023-11-03 CN disclosed
CN-219789512-U Light transparent combined front plate for packaging photovoltaic module 苏州弘道新材料有限公司 2023-10-03 CN disclosed
US-11655323-B2 Poly(amide-imide) copolymer film and method for preparing same LG CHEM, LTD. (KR) 2023-05-23 US disclosed
US-11635547-B2 Composition for the manufacture of an ophthalmic lens comprising an encapsulated light-absorbing additive ESSILOR INTERNATIONAL (FR) 2023-04-25 US disclosed
US-4504628-A Polymerizable UV light stabilizers from isocyanatoalkyl esters of unsaturated carboxylic acids THE DOW CHEMICAL COMPANY (US) 1985-03-12 US disclosed
US-4467035-A Cultivation of phototrophic bacteria in the absence of ultraviolet light NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1984-08-21 US disclosed
EP-0065574-A1 PHOTOSYNTHETIC BACTERIA CULTURE NIPPON CARBIDE KOGYO KABUSHIKI KAISHA (JP) 1982-12-01 EP disclosed
US-4235043-A Method for cultivating algae and a covering material used therefor Nippon Carbide Kogyo Kabashiki Kaisha (JP) 1980-11-25 US disclosed