Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TBXAS1 | P24557 | 3/20 | 0.49 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27431775 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL28401023 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL28207153 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL26606121 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL10456414 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL5086764 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL16163817 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL16163925 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL5090773 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A | |
| SCHEMBL6421567 | 1.00 | TBXAS1 (0.49) | TBXAS1CYP17A1KDM4EKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115418686-B | Through hole high-depth copper electroplating solution for glass substrate and copper electroplating process thereof | 深圳创智芯联科技股份有限公司 | 2023-01-10 | — | — | CN | claimed |
| CN-115418686-A | Through hole high-depth copper electroplating solution for glass substrate and copper electroplating process thereof | 深圳创智芯联科技股份有限公司 | 2022-12-02 | — | — | CN | claimed |
| EP-1563287-B2 | ELECTROCHEMICAL GAS SENSOR | LIFE SAFETY GERMANY GMBH (DE) | 2019-10-30 | — | — | EP | claimed |
| US-10106686-B2 | Particles for electrophoretic displays | MERCK PATENT GMBH (DE) | 2018-10-23 | — | — | US | claimed |
| EP-2602307-B1 | LUBRICANT COMPOSITION WITH RUST INHIBITING PROPERTIES AND WITH AN IONIC LIQUID AS THE BASE OIL | KYODO YUSHI (JP) | 2017-05-10 | — | — | EP | claimed |
| EP-1563287-B1 | ELECTROCHEMICAL GAS SENSOR | LIFE SAFETY GERMANY GMBH (DE) | 2017-05-03 | — | — | EP | claimed |
| CN-104450020-B | A kind of anti-extreme-pressure wear-resistant type chain drain oil compositions and preparation method thereof | 宁波春蕊润滑油有限公司 | 2016-09-28 | — | — | CN | claimed |
| CN-104450020-A | Extreme-pressure-resisting wear-resisting type long-acting lubricating oil composition and preparation method thereof | NINGBO CHUNRUI LUBRICANT CO LTD | 2015-03-25 | — | — | CN | claimed |
| CN-118324698-A | Imidazole phosphinate ionic liquid and preparation method and application thereof | 华南理工大学 | 2024-07-12 | — | — | CN | disclosed |
| CN-118065002-A | Radiation-resistant polymer network flexible wearable material and preparation method thereof | 四川大学 | 2024-05-24 | — | — | CN | disclosed |
| EP-3008134-B1 | PARTICLES FOR ELECTROPHORETIC DISPLAYS | E INK CORP (US) | 2024-03-06 | — | — | EP | disclosed |
| WO-2024043165-A1 | CURABLE COMPOSITION AND COMPOSITE MATERIAL | 日東電工株式会社 | 2024-02-29 | — | — | WO | disclosed |
| US-20240018357-A1 | AROMATIC POLYSULFONE, RESIN COMPOSITION, AND METHOD FOR PRODUCING AROMATIC POLYSULFONE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-01-18 | — | — | US | disclosed |
| EP-4269470-A1 | AROMATIC POLYSULFONE, RESIN COMPOSITION, AND METHOD FOR PRODUCING AROMATIC POLYSULFONE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-01 | — | — | EP | disclosed |
| CN-1898187-B | Fluorinating agent and method for producing fluorine-containing compound using same | SUMITOMO CHEMICAL CO | 2010-06-09 | — | — | CN | disclosed |
| CN-101298436-A | Fluorinating agent and method for producing fluorine-containing compound using the same | SUMITOMO CHEMICAL CO (JP) | 2008-11-05 | — | — | CN | disclosed |
| US-20080075962-A1 | Polyolefin-Based Resin Composition for Metal Coating, and Resin Film and Resin-Coated Metal Material Using the Same | NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) | 2008-03-27 | — | — | US | disclosed |
| CN-1898187-A | Fluorinating agent and method for producing fluorine-containing compound using same | SUMITOMO CHEMICAL CO (JP) | 2007-01-17 | — | — | CN | disclosed |
| CN-1176750-C | Dibasic ion liquid containing dialkylation imidazole salt and imidazole as well as its preparing method | 华东师范大学 | 2004-11-24 | — | — | CN | disclosed |
| CN-1445021-A | Dibasic ion liquid containing dialkylation imidazole salt and imidazole as well as its preparing method | UNIV HUADONG (CN) | 2003-10-01 | — | — | CN | disclosed |