Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | OPRM1 | P35372 | 1/20 | 0.43 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.41 |
| ▸ | SMPD1 | P17405 | 4/20 | 0.38 |
| ▸ | FDPS | P14324 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | TP53 | P04637 | 2/20 | 0.35 |
| ▸ | DNM1 | Q05193 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.34 |
| ▸ | ADH1B | P00325 | 1/20 | 0.34 |
| ▸ | ADH1C | P00326 | 1/20 | 0.34 |
| ▸ | ADH1A | P07327 | 1/20 | 0.34 |
| ▸ | ADH4 | P08319 | 1/20 | 0.34 |
| ▸ | ADH7 | P40394 | 1/20 | 0.34 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.34 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.34 |
| ▸ | GMNN | O75496 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | THPO | P40225 | 1/20 | 0.34 |
| ▸ | MTOR | P42345 | 1/20 | 0.34 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Iodide SCHEMBL5087292 | 1.00 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Iodide SCHEMBL5087894 | 1.00 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Iodide SCHEMBL5087118 | 0.98 | OPRM1 (0.44) | OPRM1SPHK1SMPD1FDPSLMNA | |
| SCHEMBL2872716 | 0.98 | OPRM1 (0.44) | OPRM1SPHK1SMPD1FDPSLMNA | |
| SCHEMBL2871697 | 0.98 | OPRM1 (0.44) | OPRM1SPHK1SMPD1FDPSLMNA | |
| SCHEMBL2867488 | 0.98 | OPRM1 (0.44) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Water SCHEMBL3485896 | 0.96 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Water SCHEMBL3485586 | 0.96 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Hydrochloric Acid SCHEMBL11831029 | 0.96 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA | |
| Hydrochloric Acid SCHEMBL5087021 | 0.96 | OPRM1 (0.43) | OPRM1SPHK1SMPD1FDPSLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080214386-A1 | Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-04 | — | — | US | disclosed |
| EP-1217011-B1 | Process for producing an expoxidized polymer | KURARAY CO (JP) | 2005-10-12 | — | — | EP | disclosed |
| US-6541575-B2 | Epoxidation of polymer having olefinic carbon-carbon double in absence of alkali metal by adding aqueous solution of ammonium tungstate and/or tungstophosphoric acid and phosphoric acid, adding hydrogen peroxide and quternary ammonium salt | KURARAY CO., LTD. (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020082348-A1 | Process for producing an epoxidized polymer | KURARAY CO. LTD, (JP) | 2002-06-27 | — | — | US | disclosed |
| EP-1217011-A1 | Process for producing an expoxidized polymer | KURARAY CO., LTD. (JP) | 2002-06-26 | — | — | EP | disclosed |