SCHEMBL5085948

SCHEMBL5085948

Cl[Si](Cl)(Cl)C12C=CC(CC1)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10431550 0.75
SCHEMBL6537568 0.74
SCHEMBL445872 0.74
SCHEMBL2122666 0.72
SCHEMBL8852204 0.70
SCHEMBL5701652 0.70
SCHEMBL5701387 0.69
SCHEMBL5701680 0.65
SCHEMBL5701621 0.65
SCHEMBL5701515 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106831845-B Boron-containing organosilicon compounds, method for the production and use thereof 北京康美特科技股份有限公司 2021-01-26 CN disclosed
CN-106854451-B Sealing agent for solar cell module, and sealing method for solar cell module 北京康美特科技股份有限公司 2020-10-02 CN disclosed
US-20080284957-A1 Optical Resin Film, Optical Compensation Sheet, Polarizing Plate and Liquid Crystal Display FUJIFILM CORPORATION (JP) 2008-11-20 US disclosed
EP-1510520-B1 Preparation of branched siloxane SHINETSU CHEMICAL CO (JP) 2006-07-26 EP disclosed
US-6943264-B2 Preparation of branched siloxane SHIN-ETSU CHEMICAL, CO., LTD. (JP) 2005-09-13 US disclosed
US-20050049427-A1 Preparation of branched siloxane SHIN-ETSU CHEMICAL CO., LTD. (JP) 2005-03-03 US disclosed
EP-1510520-A1 Preparation of branched siloxane Shin-Etsu Chemical Co., Ltd. (JP) 2005-03-02 EP disclosed
US-20040242782-A1 Rubber composition and vulcanized rubber SUMITOMO CHEMICAL COMPANY, LIMITED 2004-12-02 US disclosed
US-6777570-B2 Process for producing norbornene derivative having organosilyl group MITSUBISHI CHEMICAL CORPORATION (JP) 2004-08-17 US disclosed
US-20040063982-A1 Process for producing norbornene derivative having organosilyl group MITSUBISHI CHEMICAL CORPORATION (JP) 2004-04-01 US disclosed
EP-0862589-B1 ADDITION POLYMERS OF POLYCYCLOOLEFINS CONTAINING SILYL FUNCTIONAL GROUPS SUMITOMO BAKELITE CO (JP) 2004-02-18 EP disclosed
US-6031058-A POLYMERS OF THE INVENTION INCLUDE POLYCYCLIC REPEAT UNITS THAT CONTAIN PENDANT SILYL FUNCTIONAL GROUPS THE B.F. GOODRICH COMPANY (US) 2000-02-29 US disclosed
US-5912313-A MOLDINGS, COATINGS, ADHESIVES, MEMBRANES; OXIDATION, HEAT AND CHEMICAL RESISTANCE; DIELECTRICS, INTEGRATED CIRCUITS THE B. F. GOODRICH COMPANY (US) 1999-06-15 US disclosed
EP-0095787-A1 Coupling process for living polymers SHELL INTERNATIONALE RESEARCHMAATSCHAPPIJ B.V. (NL) 1983-12-07 EP disclosed
US-4408017-A STAR POLYMERS SHELL OIL COMPANY (US) 1983-10-04 US disclosed
US-4216024-A Process for producing mineral fillers with graft peroxy groups for polymers ENIKOLOPOV NIKOLAI S (SU) 1980-08-05 US disclosed
US-4214914-A Method for producing mineral fillers containing graft hydroperoxide groups for use with polymers ENIKOLOPOV NIKOLAI S (SU) 1980-07-29 US disclosed
US-4028483-A EPDM interpolymers formed with unsaturated organosilanes COPOLYMER RUBBER & CHEMICAL CORPORATION (US) 1977-06-07 US disclosed