⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5701387 | 0.79 | — | — | |
| SCHEMBL8852204 | 0.77 | — | — | |
| SCHEMBL5701515 | 0.75 | — | — | |
| SCHEMBL10431550 | 0.74 | — | — | |
| SCHEMBL28895004 | 0.74 | — | — | |
| SCHEMBL5085948 | 0.74 | — | — | |
| SCHEMBL445872 | 0.73 | — | — | |
| SCHEMBL5701926 | 0.73 | — | — | |
| SCHEMBL2122666 | 0.72 | — | — | |
| SCHEMBL5701680 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1148396-C | Photoeresist composition comprising polycyclic polymers with acid labile pendant groups | ס�ѵ�ľ��ʽ���� | 2004-05-05 | — | — | CN | disclosed |
| US-6723486-B2 | POLYMERIZING AT LEAST TWO TYPES OF POLYCYCLIC (NORBORNENE) MONOMERS ONE OF WHICH CONTAINING A PENDANT ACID LABILE GROUP AND ANOTHER OF WHICH CONTAINING A PENDNT POLAR FUNCTIONAL GROUP USING A GROUP 8 TRANSITION METAL CATALYST | SUMITOMO BAKELITE CO., LTD. (JP) | 2004-04-20 | — | — | US | disclosed |
| US-20020128408-A1 | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-6232417-B1 | USING COORDINATION CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-15 | — | — | US | disclosed |
| CN-1269810-A | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | GOODRICH CO B F (US) | 2000-10-11 | — | — | CN | disclosed |
| EP-1021477-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-1999014256-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |