Iodide

Iodide

SCHEMBL5086672

CCCCC(CCC)C(N)(CCCC)CCCC.I

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.33
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
DNM1 Q05193 2/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
OPRM1 P35372 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2868227 0.98 FDPS (0.34) FDPSALDH1A1TDP1DNM1CA1
Bromide SCHEMBL3126204 0.96 FDPS (0.33) FDPSALDH1A1TDP1DNM1CA1
Hydrochloric Acid SCHEMBL5094346 0.96 FDPS (0.33) FDPSALDH1A1TDP1DNM1CA1
Iodide SCHEMBL5091363 0.96 FDPS (0.35) FDPSALDH1A1TDP1DNM1CA1
SCHEMBL302193 0.93 FDPS (0.37) FDPSALDH1A1TDP1DNM1CA1
Iodide SCHEMBL5093201 0.91 FDPS (0.41) FDPSALDH1A1TDP1DNM1OPRM1
Fluoride SCHEMBL8161717 0.91 FDPS (0.35) FDPSALDH1A1TDP1DNM1CA1
Water SCHEMBL28462530 0.91 FDPS (0.35) FDPSALDH1A1TDP1DNM1CA1
Bromide SCHEMBL5087902 0.91 FDPS (0.35) FDPSALDH1A1TDP1DNM1CA1
Hydrochloric Acid SCHEMBL5088126 0.91 FDPS (0.35) FDPSALDH1A1TDP1DNM1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080214386-A1 Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-09-04 US disclosed