Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1276874 | 0.95 | — | — | |
| Hydrochloric Acid SCHEMBL5086872 | 0.91 | — | — | |
| Iodide SCHEMBL5091357 | 0.91 | — | — | |
| SCHEMBL29666349 | 0.91 | — | — | |
| SCHEMBL22272039 | 0.76 | — | — | |
| Bromide SCHEMBL5155661 | 0.75 | — | — | |
| 2,2,3-Trimethylbutane SCHEMBL28139734 | 0.73 | ALDH1A1 (0.33) | — | |
| SCHEMBL7910685 | 0.73 | — | — | |
| SCHEMBL261811 | 0.73 | — | — | |
| SCHEMBL26031541 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108404978-B | Application of alkyl quaternary phosphonium salt as catalyst in synthesis of carbonic acid dibasic esters | 中国海洋石油集团有限公司 | 2020-07-03 | — | — | CN | claimed |
| CN-108404978-B | Application of alkyl quaternary phosphonium salt as catalyst in synthesis of carbonic acid dibasic esters | 中国海洋石油集团有限公司 | 2020-07-03 | — | — | CN | disclosed |
| US-20080214386-A1 | Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-04 | — | — | US | disclosed |