Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS | P14324 | 1/20 | 0.35 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2834536 | 0.98 | FDPS (0.36) | FDPSDNM1ALDH1A1TDP1 | |
| Iodide SCHEMBL5085067 | 0.96 | FDPS (0.41) | FDPSDNM1 | |
| Iodide SCHEMBL5091777 | 0.96 | FDPS (0.33) | FDPSDNM1 | |
| Hydrochloric Acid SCHEMBL1977248 | 0.95 | FDPS (0.35) | FDPSDNM1ALDH1A1TDP1 | |
| Bromide SCHEMBL3043996 | 0.95 | FDPS (0.35) | FDPSDNM1ALDH1A1TDP1 | |
| Iodide SCHEMBL5087217 | 0.94 | FDPS (0.44) | FDPSDNM1 | |
| Iodide SCHEMBL5092266 | 0.94 | FDPS (0.44) | FDPSDNM1 | |
| Iodide SCHEMBL5139817 | 0.94 | FDPS (0.44) | FDPSDNM1 | |
| Iodide SCHEMBL5086930 | 0.94 | FDPS (0.44) | FDPSDNM1 | |
| Iodide SCHEMBL5087045 | 0.94 | FDPS (0.44) | FDPSDNM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080214386-A1 | Stability; easily separated from solution; surface treatment of catalyst with Group seven compound; reacting epoxide with carbon dioxide | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2008-09-04 | — | — | US | disclosed |