Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | RAB9A | P51151 | 2/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | HSPA5 | P11021 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | FDPS | P14324 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.33 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.33 |
| ▸ | TBXAS1 | P24557 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | BRAF | P15056 | 1/20 | 0.31 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11652088 | 0.88 | PDE4A (0.42) | NPC1RAB9AKMT2AFDPSPRMT5 | |
| SCHEMBL7024696 | 0.86 | KMT2A (0.36) | NPC1RAB9AKMT2A | |
| SCHEMBL7196095 | 0.83 | NPC1 (0.46) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL6281989 | 0.81 | NPC1 (0.47) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL6666888 | 0.78 | NPC1 (0.49) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL7797221 | 0.78 | NPC1 (0.44) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL28882574 | 0.76 | NPC1 (0.47) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL22662183 | 0.76 | NPC1 (0.44) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL647802 | 0.76 | NPC1 (0.44) | NPC1RAB9AKMT2AHSPA5ALDH1A1 | |
| SCHEMBL28612372 | 0.74 | NPC1 (0.46) | NPC1RAB9AKMT2AHSPA5ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2868 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3819126-B1 | METHOD OF PRINTING ON A LAYER WITH STABLE RADICAL PHOTOINITIATOR | HEIDELBERGER DRUCKMASCH AG (DE) | 2024-06-26 | — | — | EP | claimed |
| CN-118192167-A | Photosensitive resin composition, color conversion layer prepared from the same, and image display device | 茂名清荷科技有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-118192166-A | Photosensitive resin composition, color conversion layer prepared from the same, and image display device | 茂名清荷科技有限公司 | 2024-06-14 | — | — | CN | claimed |
| CN-113168094-B | Photosensitive coloring resin composition, cured product, coloring spacer and image display device | 三菱化学株式会社 | 2024-06-11 | — | — | CN | claimed |
| CN-113341647-B | Dry film resist composition and dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-113176706-B | Dry film resist composition | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-112947001-B | Photosensitive resin composition, dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-118050770-A | Uniform light scintillation array and preparation method thereof | 宁波虔东科浩光电科技有限公司 | 2024-05-17 | — | — | CN | claimed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | claimed |
| CN-112506005-B | High-adhesion electroplating-resistant photosensitive dry film resist | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | claimed |
| US-4956266-A | PhHOTORESISTS, PHOTOINITIATORS, MULTILAYER ELEMENTS, IMAGEWISE EXPOSURE TO ELECTROMAGNETIC RADIATION, BASIFICATION | IMPERIAL CHEMICAL INDUSTRIES PLC (GB) | 1990-09-11 | — | — | US | claimed |
| US-4866183-A | OXIDIZING TRIARYLIMIDAZOUS IN AQUEOUS ORGANIC TWO PHASE SYSTEM USING HYPOHALITE AND ONIUM SALT | BASF AKTIENGESELLSCHAFT (DE) | 1989-09-12 | — | — | US | claimed |
| US-4716095-A | PRETREATMENT WITH ACID | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-12-29 | — | — | US | claimed |
| US-4698293-A | Process for forming positive tonable images using a photosensitive material containing at least 1,4-dihydropyridine | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-10-06 | — | — | US | claimed |
| EP-0224137-A2 | Process for forming positive tonable images using a photosensitive material containing at least one 1,4-dihydropyridine | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-06-03 | — | — | EP | claimed |
| EP-0223206-A2 | Method for reducing color cross-contamination during re-imaging of phototackifiable materials | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-05-27 | — | — | EP | claimed |
| EP-0073304-B1 | A METHOD OF STORING DATA IN A STORAGE DEVICE | International Business Machines Corporation (US) | 1986-02-12 | — | — | EP | claimed |
| US-4358529-A | BINDER, A HEXAARYLBIIMIDAZOLE, A DIHYDROPYRIDINE, AND AN IMIDOTHIOESTER OR A TAUTOMER; NONSILVER PHOTOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-11-09 | — | — | US | claimed |
| US-4346162-A | THIO COMPOUNDS IN NONSILVER PHOTGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1982-08-24 | — | — | US | claimed |
| US-4043819-A | Photo-polymerizable material for the preparation of stable polymeric images and process for making them by photopolymerization in a matrix | CIBA-GEIGY AG (CH) | 1977-08-23 | — | — | US | claimed |