SCHEMBL51026

SCHEMBL51026

COCC(COC)(COC)COC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9144749 0.89
SCHEMBL12138334 0.89
SCHEMBL16328151 0.83
SCHEMBL16340652 0.83
SCHEMBL16327347 0.83
SCHEMBL24485279 0.83
SCHEMBL11982440 0.81 ALDH1A1 (0.35)
SCHEMBL118710 0.81 ALDH1A1 (0.35)
SCHEMBL813714 0.81 ALDH1A1 (0.35)
SCHEMBL23964464 0.80 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 299 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108084447-B Carboxyl-terminated hyperbranched polymer and application thereof in preparation of high-performance plastic composite material 武汉超支化树脂科技有限公司 2021-03-02 CN claimed
US-12024581-B2 Polyol composition DOW GLOBAL TECHNOLOGIES LLC (US) 2024-07-02 US disclosed
US-12017188-B2 Dendrimer particles and related mixed matrix filtration membranes, compositions, methods, and systems CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2024-06-25 US disclosed
US-12017188-B2 Dendrimer particles and related mixed matrix filtration membranes, compositions, methods, and systems CALIFORNIA INSTITUTE OF TECHNOLOGY (US) 2024-06-25 US disclosed
US-20230400770-A1 Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-11786444-B2 Dental polyfunctional monomers and dental hydroxyl group-containing monomers MITSUI CHEMICALS, INC. (JP) 2023-10-17 US disclosed
US-20230265438-A1 NUCLEIC ACIDS FOR INHIBITING EXPRESSION OF CNNM4 IN A CELL ASOCIACION CENTRO DE INVESTIG COOPERATIVA EN BIOCIENCIAS CIC BIOGUNE (ES) 2023-08-24 US disclosed
WO-2023028316-A1 AMINOTHIOL-CONJUGATES, COMPOSITIONS, AND METHODS OF USE THEREOF THE BURLINGTON HC RESEARCH GROUP, INC. (US) 2023-03-02 WO disclosed
CN-115718406-A Photosensitive resin composition for forming resist, resin film, cured film, and semiconductor device 住友电木株式会社 2023-02-28 CN disclosed
US-11518728-B2 Multi-arm single molecular weight polyethylene glycol, active derivative thereof, and preparation and application thereof JENKEM TECHNOLOGY CO., LTD. (TIANJIN) (CN) 2022-12-06 US disclosed
US-6984743-B1 Method for producing metallocenes BASELL POLYOLEFINE GMBH (DE) 2006-01-10 US disclosed
EP-0377660-B1 SPHERICAL PERFLUOROETHERS EXFLUOR RES CORP (US) 1995-12-20 EP disclosed
EP-0328102-B1 NOVEL POLYVINYL ALCOHOL AND PROCESS FOR PRODUCING POLYVINYL ALCOHOL BY HYDROLYSIS CATALYSED BY ACIDS Kuraray Co., Ltd. (JP) 1993-05-12 EP disclosed
EP-0225137-B1 PROCESS FOR PRODUCING A TETRAALKOXYSILANE Chisso Corporation (JP) 1993-03-10 EP disclosed
US-5047469-A Novel polyvinyl alcohol and process for producing polyvinyl alcohol by hydrolysis catalyzed by acids KURARAY CO., LTD. (JP) 1991-09-10 US disclosed
EP-0328102-A2 Novel polyvinyl alcohol and process for producing polyvinyl alcohol by hydrolysis catalysed by acids Kuraray Co., Ltd. (JP) 1989-08-16 EP disclosed
US-4752647-A REACTING SILICON AND AN ALKYL ALCOHOL USING AN ALKALI METAL ALKOXIDE DISSOLVED IN AN ETHER CHISSO CORPORATION (JP) 1988-06-21 US disclosed
EP-0225137-A2 Process for producing a tetraalkoxysilane Chisso Corporation (JP) 1987-06-10 EP disclosed
US-4031158-A LUBRICANT, COSMETICS, TEXTILES LION FAT & OIL CO., LTD. (JA) 1977-06-21 US disclosed
US-3945961-A Novel cross-linking agents and their use in electrophoretic coating composition AMERICAN CYANAMID COMPANY (US) 1976-03-23 US disclosed