SCHEMBL51058

SCHEMBL51058

CC(C)(C)c1ccc(O)c(Cc2cc(C(C)(C)C)ccc2O)c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 4/20 0.67
ALDH1A1 P00352 2/20 0.61
HPGD P15428 2/20 0.61
ALOX15 P16050 2/20 0.61
HSD17B10 Q99714 1/20 0.61
TDP1 Q9NUW8 1/20 0.61
KLF10 Q13118 1/20 0.57
MAPT P10636 4/20 0.55
MEN1 O00255 3/20 0.55
KMT2A Q03164 3/20 0.55
GAA P10253 1/20 0.55
PKM P14618 1/20 0.55
RECQL P46063 1/20 0.55
CYP1A2 P05177 1/20 0.54
CYP2C19 P33261 1/20 0.54
ESR1 P03372 5/20 0.52
ESR2 Q92731 3/20 0.52
SMN1; SMN2 Q16637 3/20 0.50
CYP3A4 P08684 3/20 0.50
USP2 O75604 2/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1345214 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL1343857 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL3821963 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL1345705 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL3810884 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL1345527 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL3819212 0.92 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL9751995 0.91 CYP2D6 (0.59) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL30578945 0.91 AMY1A (0.62) CYP2D6ALDH1A1HPGDALOX15HSD17B10
SCHEMBL21002165 0.87 CYP2D6 (0.67) CYP2D6ALDH1A1HPGDALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107400361-A A kind of LCP/PPS composites and preparation method thereof 广东壹豪新材料科技股份有限公司 2017-11-28 CN claimed
CN-104877582-B Heat-insulated glued membranes of high-performance PVB and preparation method thereof 上海沪正纳米科技有限公司 2017-09-29 CN claimed
CN-105331062-B A kind of carbon nanotube/polylactic acid conductive composite material and preparation method 中国石油化工股份有限公司 2017-09-29 CN claimed
US-4533929-A ANIONIC SURFACTANTS AS ANTIFOGGING AGENTS; DIETHYLHEXYL SULFOSUCCINATE FUJI PHOTO FILM CO., LTD. (JP) 1985-08-06 US claimed
CN-114302885-A Calixarene compound and use thereof 维也纳大学 2022-04-08 CN disclosed
EP-2484534-B1 RECORDING MATERIAL USING PHENOLIC COMPOUND NIPPON SODA CO (JP) 2019-01-16 EP disclosed
CN-109192800-A A kind of fluorine-containing thin-film solar cells cephacoria and its manufacturing process 浙江歌瑞新材料有限公司 2019-01-11 CN disclosed
CN-106700129-B A kind of esters antioxidant of sterically hindered phenol and its preparation method and application 北京吉海川科技发展有限公司 2018-11-23 CN disclosed
US-20180120701-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed
CN-107400361-A A kind of LCP/PPS composites and preparation method thereof 广东壹豪新材料科技股份有限公司 2017-11-28 CN disclosed
CN-104877582-B Heat-insulated glued membranes of high-performance PVB and preparation method thereof 上海沪正纳米科技有限公司 2017-09-29 CN disclosed
CN-105331062-B A kind of carbon nanotube/polylactic acid conductive composite material and preparation method 中国石油化工股份有限公司 2017-09-29 CN disclosed
EP-0203613-A2 Light-sensitive material containing microcapsules and image-recording method using the same FUJI PHOTO FILM CO., LTD. (JP) 1986-12-03 EP disclosed
EP-0109930-B1 CHROMOGENIC BIS-QUINAZOLINE COMPOUNDS, METHOD OF PREPARING THEM AND THEIR USE AS CHROMOGENES IN PRESSURE-SENSITIVE OR HEAT-SENSITIVE RECORDING MATERIALS CIBA-GEIGY AG (CH) 1986-09-17 EP disclosed
US-4598035-A LEUCO AND DISAZO DYES FUJI PHOTO FILM CO., LTD. (JP) 1986-07-01 US disclosed
US-4533929-A ANIONIC SURFACTANTS AS ANTIFOGGING AGENTS; DIETHYLHEXYL SULFOSUCCINATE FUJI PHOTO FILM CO., LTD. (JP) 1985-08-06 US disclosed
US-4529681-A Microcapsules containing vinyl compound, photoinitiator and color forming compound FUJI PHOTO FILM CO., LTD. (JP) 1985-07-16 US disclosed
US-4479138-A PHENYL BENZOIC ESTER TO INCREASE SENSITIVITY FUJI PHOTO FILM CO., LTD. (JP) 1984-10-23 US disclosed
EP-0109930-A1 Chromogenic bis-quinazoline compounds, method of preparing them and their use as chromogenes in pressure-sensitive or heat-sensitive recording materials CIBA-GEIGY AG (CH) 1984-05-30 EP disclosed
EP-0109838-A2 Light and heat-sensitive recording material FUJI PHOTO FILM CO., LTD. (JP) 1984-05-30 EP disclosed