⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7157180 | 0.94 | — | — | |
| SCHEMBL28630887 | 0.86 | — | — | |
| SCHEMBL5341657 | 0.82 | — | — | |
| SCHEMBL996861 | 0.81 | NPSR1 (0.32) | — | |
| SCHEMBL31178055 | 0.81 | NPSR1 (0.32) | — | |
| SCHEMBL949926 | 0.81 | — | — | |
| SCHEMBL7710151 | 0.81 | — | — | |
| SCHEMBL29276611 | 0.81 | — | — | |
| SCHEMBL4080301 | 0.81 | — | — | |
| SCHEMBL28634187 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 183 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1961260-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2007-05-09 | — | — | CN | claimed |
| EP-1766474-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2007-03-28 | — | — | EP | claimed |
| US-7189491-B2 | Photoresist composition for deep UV and process thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-03-13 | — | — | US | claimed |
| WO-2005121894-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. (DE) | 2005-12-22 | — | — | WO | claimed |
| US-20050271974-A1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2005-12-08 | — | — | US | claimed |
| EP-1379331-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD. (CH) | 2004-01-14 | — | — | EP | claimed |
| US-6610465-B2 | One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-08-26 | — | — | US | claimed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| US-6048664-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES, INC. (US) | 2000-04-11 | — | — | US | claimed |
| CN-1228410-A | Copolymer resin, preparation thereof, and photo resist using the same | HYUNDAI ELECTRONICS IND (KR) | 1999-09-15 | — | — | CN | claimed |
| CN-115210219-A | Oxime ester photoinitiators | 巴斯夫欧洲公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-113316744-A | Oxime ester photoinitiators with specific aroyl chromophores | 巴斯夫欧洲公司 | 2021-08-27 | — | — | CN | disclosed |
| CN-104714366-B | Colored curable resin composition | 东友精细化工有限公司 | 2020-05-08 | — | — | CN | disclosed |
| EP-1815296-B1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2020-02-19 | — | — | EP | disclosed |
| US-6251560-B1 | PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-06-26 | — | — | US | disclosed |
| EP-1078945-A2 | Polymer for use in a photoresist composition | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-02-28 | — | — | EP | disclosed |
| CN-1269810-A | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | GOODRICH CO B F (US) | 2000-10-11 | — | — | CN | disclosed |
| US-6048664-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES, INC. (US) | 2000-04-11 | — | — | US | disclosed |
| US-5637746-A | REACTING HYDROGEN SILANE OR HYDROGEN SILOXANE COMPOUNDS WITH A TERTIARY BUTYL ESTER HAVING ATLEAST ONE OLEFINIC BOND, CONVERTING INTERMEDIATED SILOXANE BONDED ESTER TO ACID GROUP WITH ELIMINATION OF ISOBUTENE; HYDROSILATION | TH. GOLDSCHMIDT AG. (DE) | 1997-06-10 | — | — | US | disclosed |