SCHEMBL512358

SCHEMBL512358

FC1=CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3423920 0.69 PDE3B (0.31)
SCHEMBL2568698 0.68
SCHEMBL10826700 0.68
SCHEMBL165725 0.68
SCHEMBL220699 0.68
SCHEMBL6715260 0.68
SCHEMBL189482 0.68
SCHEMBL4666280 0.68
SCHEMBL161708 0.68
SCHEMBL9625106 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230360922-A1 ROBUST ASHABLE HARD MASK LAM RESEARCH CORPORATION 2023-11-09 US disclosed
CN-110609445-B Polyoxometalate and heteropolyoxometalate compositions and methods of use thereof 默克专利有限公司 2023-10-03 CN disclosed
CN-115735262-A Robust ashable hard mask 朗姆研究公司 2023-03-03 CN disclosed
US-11421128-B2 Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer MERCK PATENT GMBH (DE) 2022-08-23 US disclosed
CN-110100206-B Spin-coated material compositions comprising metal oxide nanoparticles and organic polymers 默克专利有限公司 2022-06-17 CN disclosed
EP-3812839-B1 POLYOXOMETALATE AND HETEROPOLYOXOMETALATE COMPOSITIONS AND METHOD USING THEM MERCK PATENT GMBH (DE) 2022-05-11 EP disclosed
WO-2022066927-A1 ROBUST ASHABLE HARD MASK LAM RESEARCH CORPORATION (US) 2022-03-31 WO disclosed
CN-108139673-B Metal oxide containing materials, methods of making and methods of using the same 默克专利有限公司 2021-06-15 CN disclosed
EP-3812839-A1 POLYOXOMETALATE AND HETEROPOLYOXOMETALATE COMPOSITIONS AND METHODS FOR THEIR USE Merck Patent GmbH (DE) 2021-04-28 EP disclosed
EP-3559746-B1 COMPOSITION OF SPIN-ON MATERIALS CONTAINING METAL OXIDE NANOPARTICLES AND AN ORGANIC POLYMER MERCK PATENT GMBH (DE) 2021-03-31 EP disclosed
US-20050202351-A1 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof CLARIANT INTERNATIONAL LTD. (CH) 2005-09-15 US disclosed
US-20050202340-A1 Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof MERCK PATENT GMBH (DE) 2005-09-15 US disclosed
US-20040166434-A1 Photoresist composition for deep ultraviolet lithography AZ ELECTRONIC MATERIALS USA CORP. 2004-08-26 US disclosed
US-20040166433-A1 Photoresist composition for deep ultraviolet lithography AZ ELECTRONIC MATERIALS USA CORP. 2004-08-26 US disclosed
US-5763517-A Thermoplastic resin composition and molded product thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1998-06-09 US disclosed
EP-0561631-B1 Thermoplastic resin composition and molded product thereof MITSUI PETROCHEMICAL IND (JP) 1997-09-17 EP disclosed
EP-0561632-B1 Polyamide resin composition and connector MITSUI PETROCHEMICAL IND (JP) 1996-08-21 EP disclosed
US-5306754-A Blend of polyamide, graft polymer and antioxidant MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1994-04-26 US disclosed
EP-0561632-A1 Polyamide resin composition and connector MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1993-09-22 EP disclosed
EP-0561631-A1 Thermoplastic resin composition and molded product thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1993-09-22 EP disclosed