⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13475029 | 0.81 | — | — | |
| SCHEMBL13918144 | 0.80 | — | — | |
| SCHEMBL239594 | 0.79 | NR1H2 (0.31) | — | |
| SCHEMBL11913564 | 0.72 | — | — | |
| SCHEMBL11342848 | 0.71 | — | — | |
| SCHEMBL14268106 | 0.71 | — | — | |
| SCHEMBL8732729 | 0.70 | — | — | |
| SCHEMBL29543809 | 0.67 | — | — | |
| SCHEMBL11348993 | 0.66 | — | — | |
| SCHEMBL17867620 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 209 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7700257-B2 | Photoresist composition and resist pattern formation method by the use thereof | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-20 | — | — | US | claimed |
| US-7351521-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-04-01 | — | — | US | claimed |
| US-7264918-B2 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-09-04 | — | — | US | claimed |
| US-20070172762-A1 | Photoresist composition for deep ultraviolet lithography | DAMMEL RALPH R | 2007-07-26 | — | — | US | claimed |
| US-20070154841-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2007-07-05 | — | — | US | claimed |
| US-7211366-B2 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-05-01 | — | — | US | claimed |
| US-20060166130-A1 | Photoresist composition and method for forming resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-07-27 | — | — | US | claimed |
| US-20060154170-A1 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-07-13 | — | — | US | claimed |
| EP-1610178-A1 | RESIST COMPOSITION FOR LIQUID IMMERSION EXPOSURE PROCESS AND METHOD OF FORMING RESIST PATTERN THEREWITH | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-12-28 | — | — | EP | claimed |
| EP-1602011-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ Electronic Materials USA Corp. (US) | 2005-12-07 | — | — | EP | claimed |
| WO-2004074928-A2 | PHOTORESIST COMPOSITION FOR DEEP ULTRAVIOLET LITHOGRAPHY | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-09-02 | — | — | WO | claimed |
| US-20040166434-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | claimed |
| US-20040166433-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | claimed |
| US-11958971-B2 | Photocurable composition, method for producing concave-convex structure, method for forming fine concave-convex pattern, and concave-convex structure | MITSUI CHEMICALS, INC. (JP) | 2024-04-16 | — | — | US | disclosed |
| US-11474429-B2 | Method of producing substrate with fine uneven pattern, resin composition, and laminate | MITSUI CHEMICALS, INC. (JP) | 2022-10-18 | — | — | US | disclosed |
| US-11421128-B2 | Composition of spin-on materials containing metal oxide nanoparticles and an organic polymer | MERCK PATENT GMBH (DE) | 2022-08-23 | — | — | US | disclosed |
| US-20040166434-A1 | Photoresist composition for deep ultraviolet lithography | AZ ELECTRONIC MATERIALS USA CORP. | 2004-08-26 | — | — | US | disclosed |
| US-20040033439-A1 | Resist composition | ASAHI GLASS COMPANY LIMITED (JP) | 2004-02-19 | — | — | US | disclosed |
| US-20040013970-A1 | Resist composition | ASAHI GLASS COMPANY, LIMITED (JP) | 2004-01-22 | — | — | US | disclosed |
| EP-1343047-A2 | Resist composition | ASAHI GLASS COMPANY LTD. (JP) | 2003-09-10 | — | — | EP | disclosed |