Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC9A1 | P19634 | 8/20 | 0.53 |
| ▸ | GRM2 | Q14416 | 2/20 | 0.50 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.49 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.49 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | MGAM | O43451 | 1/20 | 0.48 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | SI | P14410 | 1/20 | 0.48 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | GLA | P06280 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | APAF1 | O14727 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29765594 | 1.00 | SLC9A1 (0.53) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL11536425 | 0.97 | SLC9A1 (0.53) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL22280919 | 0.91 | SLC9A1 (0.50) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL20713929 | 0.87 | SLC9A1 (0.56) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL31483490 | 0.86 | SLC9A1 (0.63) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL5788883 | 0.86 | SLC9A1 (0.57) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL29413796 | 0.86 | SLC9A1 (0.57) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL31483489 | 0.84 | SLC9A1 (0.61) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL8511223 | 0.84 | SLC9A1 (0.63) | SLC9A1GRM2KCNMA1EGLN3RAB9A | |
| SCHEMBL31344211 | 0.83 | SLC9A1 (0.59) | SLC9A1GRM2KCNMA1EGLN3RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9902925-B2 | Cleaner composition for process of manufacturing semiconductor and display | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-02-27 | — | — | US | claimed |
| US-9869027-B2 | Cleaning composition and method of manufacturing metal wiring using the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2018-01-16 | — | — | US | claimed |
| US-9486892-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2016-11-08 | — | — | US | claimed |
| US-20160230289-A1 | CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME | SAMSUNG DISPLAY CO LTD (KR) | 2016-08-11 | — | — | US | claimed |
| US-20160215241-A1 | CLEANER COMPOSITION FOR PROCESS OF MANUFACTURING SEMICONDUCTOR AND DISPLAY | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-07-28 | — | — | US | claimed |
| US-20150136728-A1 | CLEANING COMPOSITION AND METHOD OF MANUFACTURING METAL WIRING USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-05-21 | — | — | US | claimed |
| CN-102277242-B | Cleaning agent composition | DONGWOO FINE CHEM CO LTD | 2015-01-07 | — | — | CN | claimed |
| US-8864860-B2 | Polishing composition | FUJIMI INCORPORATED (JP) | 2014-10-21 | — | — | US | claimed |
| US-8715524-B2 | Polishing liquid | FUJIFILM CORPORATION (JP) | 2014-05-06 | — | — | US | claimed |
| US-20090004863-A1 | POLISHING LIQUID AND POLISHING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-01-01 | — | — | US | claimed |
| US-20080203354-A1 | POLISHING LIQUID | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | claimed |
| US-20070181534-A1 | Barrier polishing liquid and chemical mechanical polishing method | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | claimed |
| US-6814767-B2 | SILICA SOL, POLYOXYETHYLENE ALKYL ETHER SULFATE, BENZOTRIAZOLE CORROSION INHIBITOR, ACID AND WATER; INSULATING LAYER EROSION PREVENTION | FUJIMI INCORPORATED (JP) | 2004-11-09 | — | — | US | claimed |
| US-20040134376-A1 | Polishing composition | FUJIMI INCORPORATED (JP) | 2004-07-15 | — | — | US | claimed |
| EP-4471834-B1 | POLISHING SOLUTION AND POLISHING METHOD | FUJIFILM CORP (JP) | 2026-03-04 | — | — | EP | disclosed |
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| WO-2025105122-A1 | METHOD FOR MANUFACTURING MODIFIED SUBSTRATE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND KIT | 富士フイルム株式会社 | 2025-05-22 | — | — | WO | disclosed |
| US-6814767-B2 | SILICA SOL, POLYOXYETHYLENE ALKYL ETHER SULFATE, BENZOTRIAZOLE CORROSION INHIBITOR, ACID AND WATER; INSULATING LAYER EROSION PREVENTION | FUJIMI INCORPORATED (JP) | 2004-11-09 | — | — | US | disclosed |
| US-20040134376-A1 | Polishing composition | FUJIMI INCORPORATED (JP) | 2004-07-15 | — | — | US | disclosed |
| US-4407882-A | FOAMING INHIBITOR | CIBA-GEIGY CORPORATION (US) | 1983-10-04 | — | — | US | disclosed |