Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | CA12 | O43570 | 2/20 | 0.38 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | CA4 | P22748 | 2/20 | 0.38 |
| ▸ | CA7 | P43166 | 2/20 | 0.38 |
| ▸ | CA9 | Q16790 | 2/20 | 0.38 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.38 |
| ▸ | CA6 | P23280 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
| ▸ | CDC25B | P30305 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5268971 | 0.77 | EDNRA (0.41) | ALDH1A1MAPTHDAC8POLBAKR1C3 | |
| Hydrochloric Acid SCHEMBL7550161 | 0.76 | EDNRA (0.39) | ALDH1A1MAPTHDAC8POLBAKR1C3 | |
| SCHEMBL11352132 | 0.67 | CYP2C9 (0.58) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| Phthalic Acid SCHEMBL16341731 | 0.67 | ALDH1A1 (0.93) | ALDH1A1ALOX15KDM4EHPGDCA12 | |
| SCHEMBL8713429 | 0.67 | ALDH1A1 (0.50) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| SCHEMBL30175300 | 0.66 | ALDH1A1 (0.54) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| SCHEMBL31088428 | 0.66 | ALDH1A1 (0.54) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| SCHEMBL10457353 | 0.66 | ALDH1A1 (0.54) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| SCHEMBL4109572 | 0.66 | ALDH1A1 (0.54) | CYP2C9ALDH1A1ALOX15KDM4EHPGD | |
| Phthalic Acid SCHEMBL30498878 | 0.65 | ALDH1A1 (0.88) | ALDH1A1ALOX15KDM4EHPGDCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114516863-B | Imide sulfonate photoacid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2024-06-21 | — | — | CN | disclosed |
| CN-115368285-B | oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-115368286-B | Oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-22 | — | — | CN | disclosed |
| CN-115368287-B | I-line oxime sulfonate photoacid generator with high acid yield | 常州强力先端电子材料有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-111413849-B | Photosensitive composition, preparation method thereof, pattern forming method and application | 常州强力先端电子材料有限公司 | 2024-03-01 | — | — | CN | disclosed |
| CN-115368341-B | Oxime sulfonate compound, resist composition containing oxime sulfonate compound, electronic device and application of oxime sulfonate compound | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-115368340-B | Oxime sulfonate photoacid generator, resist composition containing oxime sulfonate photoacid generator, electronic device and application of oxime sulfonate photoacid generator | 常州强力先端电子材料有限公司 | 2024-01-26 | — | — | CN | disclosed |
| CN-116283945-A | Imide sulfonate photoacid generator, resist composition, application thereof and electronic component | 瑞红(苏州)电子化学品股份有限公司 | 2023-06-23 | — | — | CN | disclosed |
| CN-115745865-A | Imide sulfonate photoacid, resist composition, electronic device, and application | 常州强力电子新材料股份有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-115611782-A | High-acid-production oxime sulfonate photoacid generator and application of resist composition thereof | 瑞红(苏州)电子化学品股份有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-115611874-A | Oxime sulfonate photoacid, resist composition containing the same, electronic device, and use | 常州强力先端电子材料有限公司 | 2023-01-17 | — | — | CN | disclosed |
| CN-115368341-A | Oxime sulfonate compound, resist composition containing the same, electronic device and use | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115368287-A | I-line oxime sulfonate photo-acid generator with high acid yield | 常州强力先端电子材料有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-115109046-A | Imide sulfonate photo-acid generator with high acid yield, composition and application | 常州强力先端电子材料有限公司 | 2022-09-27 | — | — | CN | disclosed |
| CN-114516863-A | Imide sulfonate photo-acid generator with high acid yield, composition and application | 常州强力电子新材料股份有限公司 | 2022-05-20 | — | — | CN | disclosed |
| CN-114114839-A | Photosensitive resin composition, patterning method and application of photosensitive resin composition | 常州强力先端电子材料有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-111413849-A | Photosensitive composition, preparation method thereof, pattern forming method and application | 常州强力先端电子材料有限公司 | 2020-07-14 | — | — | CN | disclosed |
| EP-1966119-A1 | PHOTOCROSSLINKABLE MATERIALS | Rolic AG (CH) | 2008-09-10 | — | — | EP | disclosed |
| WO-2007071091-A1 | PHOTOCROSSLINKABLE MATERIALS | ROLIC AG (CH) | 2007-06-28 | — | — | WO | disclosed |