Phosphine

Phosphine

SCHEMBL5145506

C=Cc1ccc(CCl)cc1.P

nearest known ligand 0.55

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.55
TSHR P16473 1/20 0.42
CA1 P00915 3/20 0.37
CA2 P00918 3/20 0.37
TDP1 Q9NUW8 1/20 0.37
HDAC8 Q9BY41 2/20 0.36
POLB P06746 1/20 0.36
MAPT P10636 3/20 0.34
TP53 P04637 3/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
LMNA P02545 2/20 0.33
PSMD14 O00487 1/20 0.33
CHRNB2 P17787 1/20 0.32
CHRNB4 P30926 1/20 0.32
CHRNA3 P32297 1/20 0.32
CHRNA7 P36544 1/20 0.32
CHRNA4 P43681 1/20 0.32
HPGD P15428 1/20 0.32
F2R P25116 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL35299 0.97 ALDH1A1 (0.58) ALDH1A1TSHRCA1CA2TDP1
Ammonia Solution, Strong SCHEMBL456688 0.95 ALDH1A1 (0.55) ALDH1A1TSHRCA1CA2TDP1
SCHEMBL4443841 0.95 ALDH1A1 (0.55) ALDH1A1TSHRCA1CA2TDP1
Hydrogen Sulfide SCHEMBL10802025 0.95 ALDH1A1 (0.55) ALDH1A1TSHRCA1CA2TDP1
SCHEMBL5414446 0.95 ALDH1A1 (0.55) ALDH1A1TSHRCA1CA2TDP1
SCHEMBL11598719 0.91 ALDH1A1 (0.50) ALDH1A1TSHRCA1CA2TDP1
SCHEMBL28130872 0.91 ALDH1A1 (0.50) ALDH1A1TSHRCA1CA2TDP1
Trimethylammonium SCHEMBL2135750 0.89 ALDH1A1 (0.48) ALDH1A1TSHRCA1CA2TDP1
(Chloromethyl)Benzene SCHEMBL29242171 0.89 ALDH1A1 (0.54) ALDH1A1TSHRCA1CA2TDP1
Styrene SCHEMBL2831366 0.89 ALDH1A1 (0.61) ALDH1A1TSHRCA1CA2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117730107-A Phosphonium-based polymers and copolymers as additives for chemical mechanical planarization slurries 弗萨姆材料美国有限责任公司 2024-03-19 CN claimed
CN-117730107-A Phosphonium-based polymers and copolymers as additives for chemical mechanical planarization slurries 弗萨姆材料美国有限责任公司 2024-03-19 CN disclosed
EP-1735393-A4 CLEAR COATING COMPOSITION AND CLEAR COATING FILM FORMATION METHOD NIPPON PAINT CO LTD (JP) 2007-09-05 EP disclosed
EP-1735393-A1 CLEAR COATING COMPOSITION AND CLEAR COATING FILM FORMATION METHOD Nippon Paint Co., Ltd. (JP) 2006-12-27 EP disclosed
WO-2005100492-A1 CLEAR COATING COMPOSITION AND CLEAR COATING FILM FORMATION METHOD NIPPON PAINT CO., LTD. (JP) 2005-10-27 WO disclosed