⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25757562 | 0.91 | — | — | |
| SCHEMBL9737882 | 0.79 | — | — | |
| SCHEMBL1483728 | 0.75 | GAA (0.30) | — | |
| SCHEMBL420429 | 0.74 | — | — | |
| SCHEMBL360952 | 0.74 | TDP1 (0.30) | — | |
| SCHEMBL3302616 | 0.73 | — | — | |
| SCHEMBL3382714 | 0.73 | PMP22 (0.52) | — | |
| SCHEMBL8438186 | 0.72 | — | — | |
| SCHEMBL1160470 | 0.70 | — | — | |
| SCHEMBL19124968 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6686313-B2 | REDUCING ORGANOSILVER COMPOUND | AGFA-GEVAERT (BE) | 2004-02-03 | — | — | US | claimed |
| US-20020111270-A1 | Thermographic recording material with improved image tone | AGFA-GEVAERT (BE) | 2002-08-15 | — | — | US | claimed |
| EP-1211091-A1 | Thermographic recording material with improved image tone | Agfa-Gevaert (BE) | 2002-06-05 | — | — | EP | claimed |
| CN-114502362-B | Contact lenses with surfaces of different softness | 爱尔康公司 | 2024-03-26 | — | — | CN | disclosed |
| CN-115605529-B | Photochromic polydiorganosiloxane vinyl cross-linking agent | 爱尔康公司 | 2024-03-26 | — | — | CN | disclosed |
| EP-4314118-A1 | POLYSILOXANE VINYLIC CROSSLINKERS WITH HIGH REFRACTIVE INDEX | Alcon Inc. (CH) | 2024-02-07 | — | — | EP | disclosed |
| CN-116888193-A | Polysiloxane vinyl cross-linking agent with high refractive index | 爱尔康公司 | 2023-10-13 | — | — | CN | disclosed |
| EP-4189469-A1 | CONTACT LENSES WITH SOFTER LENS SURFACES | Alcon Inc. (CH) | 2023-06-07 | — | — | EP | disclosed |
| EP-4118134-A1 | PHOTOCHROMIC POLYDIORGANOSILOXANE VINYLIC CROSSLINKERS | Alcon Inc. (CH) | 2023-01-18 | — | — | EP | disclosed |
| CN-115605529-A | Photochromic polydiorganosiloxane ethylene crosslinkers | 爱尔康公司（CH） | 2023-01-13 | — | — | CN | disclosed |
| WO-2022201013-A1 | POLYSILOXANE VINYLIC CROSSLINKERS WITH HIGH REFRACTIVE INDEX | ALCON INC. (CH) | 2022-09-29 | — | — | WO | disclosed |
| US-4407937-A | QUATERNARY AMMONIUM ETHER | FUJI PHOTO FILM CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |
| US-4366238-A | FLUORINE CONTAINING WATER INSOLUB STYRENIC POLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1982-12-28 | — | — | US | disclosed |
| US-4362812-A | BETAINE COPOLYMER | FUJI PHOTO FILM CO., LTD. (JP) | 1982-12-07 | — | — | US | disclosed |
| US-4347308-A | A FLUORINE-CONTAINING 2-SULFOMETHYLSUCCINATE AS ANTISTATIC AGENT; ANIONIC SURFACTANTS; X-RAY AND COLOR FILMS | FUJI PHOTO FILM CO., LTD. (JP) | 1982-08-31 | — | — | US | disclosed |
| US-4343894-A | Photographic light-sensitive element with antistatic protective layer | FUJI PHOTO FILM CO., LTD. (JP) | 1982-08-10 | — | — | US | disclosed |
| US-4330618-A | Photographic light sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1982-05-18 | — | — | US | disclosed |
| US-4272615-A | IMPROVED ANTISTATIC PROPERTIES FLUORINATED POLYOXYALKYLENE | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-09 | — | — | US | disclosed |
| US-4251626-A | FOR X-RAY FILMS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4229524-A | ACRYLIC ESTER COPOLYMER CONTAINING FLUORINE AND POLYALKYLENE ETHER GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1980-10-21 | — | — | US | disclosed |