SCHEMBL9737882

SCHEMBL9737882

C=CS(=O)(=O)CCC(O)S(=O)(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5147016 0.79
SCHEMBL3302616 0.77
SCHEMBL3307953 0.74
SCHEMBL3308168 0.72
SCHEMBL28365433 0.72
SCHEMBL25757562 0.72
SCHEMBL27932566 0.70
SCHEMBL1483728 0.70 GAA (0.30)
SCHEMBL26553950 0.69
SCHEMBL420429 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250167363-A1 LONG-ACTING HUMIDITY-CONTROL MATERIAL FOR BATTERY PACKS AND METHOD FOR PREPARING SAME NINGBO BOOER NEW MATERIAL CO., LTD (CN) 2025-05-22 US claimed
EP-4331839-A1 LONG-ACTING HUMIDITY CONTROL MATERIAL FOR BATTERY PACK AND PREPARATION METHOD THEREFOR Ningbo Booer New Material Co., Ltd (CN) 2024-03-06 EP claimed
EP-4077279-A1 ADHESIVE PHOTOPROTECTIVE COMPOUNDS AND USES THEREOF SKINOSIVE (FR) 2022-10-26 EP claimed
CN-114867715-A Adhesive photoprotective compounds and uses thereof 斯奇诺西维 2022-08-05 CN claimed
CN-121586704-A Adhesive photoprotective compounds and uses thereof 斯奇诺西维 2026-02-27 CN disclosed
US-20250167363-A1 LONG-ACTING HUMIDITY-CONTROL MATERIAL FOR BATTERY PACKS AND METHOD FOR PREPARING SAME NINGBO BOOER NEW MATERIAL CO., LTD (CN) 2025-05-22 US disclosed
EP-4331839-A1 LONG-ACTING HUMIDITY CONTROL MATERIAL FOR BATTERY PACK AND PREPARATION METHOD THEREFOR Ningbo Booer New Material Co., Ltd (CN) 2024-03-06 EP disclosed
EP-4077279-A1 ADHESIVE PHOTOPROTECTIVE COMPOUNDS AND USES THEREOF SKINOSIVE (FR) 2022-10-26 EP disclosed
CN-114867715-A Adhesive photoprotective compounds and uses thereof 斯奇诺西维 2022-08-05 CN disclosed
WO-2021123116-A1 ADHESIVE PHOTOPROTECTIVE COMPOUNDS AND USES THEREOF SKINOSIVE (FR) 2021-06-24 WO disclosed
US-5155004-A Chitosan or chitin derivative and method for processing silver halide photographic material by using the same FUJI PHOTO FILM CO., LTD. (JP) 1992-10-13 US disclosed
EP-0185100-B1 PROCESS FOR PREPARING SILVER HALIDE EMULSION FUJI PHOTO FILM CO LTD (JP) 1990-05-30 EP disclosed
EP-0185100-A1 PROCESS FOR PREPARING SILVER HALIDE EMULSION FUJI PHOTO FILM CO., LTD. (JP) 1986-06-25 EP disclosed
EP-0164759-A2 Silver halide photographic emulsion and process for production thereof FUJI PHOTO FILM CO., LTD. (JP) 1985-12-18 EP disclosed
US-4554245-A HETEROCYCLIC MERCAPTO COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1985-11-19 US disclosed
EP-0159045-A2 Process for preparing silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1985-10-23 EP disclosed
US-4528264-A Silver halide photographic light-sensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1985-07-09 US disclosed
EP-0144990-A2 Process for preparing silver halide emulsion FUJI PHOTO FILM CO., LTD. (JP) 1985-06-19 EP disclosed
US-4418140-A ANTIFOGGING AGENTS FUJI PHOTO FILM CO., LTD. (JP) 1983-11-29 US disclosed
US-4343894-A Photographic light-sensitive element with antistatic protective layer FUJI PHOTO FILM CO., LTD. (JP) 1982-08-10 US disclosed