Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.62 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.62 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.43 |
| ▸ | AKR1A1 | P14550 | 1/20 | 0.43 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.43 |
| ▸ | HTR2A | P28223 | 1/20 | 0.43 |
| ▸ | HTR2C | P28335 | 1/20 | 0.43 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.43 |
| ▸ | HRH1 | P35367 | 1/20 | 0.43 |
| ▸ | DRD3 | P35462 | 1/20 | 0.43 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.43 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.43 |
| ▸ | SLC1A2 | P43004 | 1/20 | 0.43 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.43 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.43 |
| ▸ | TERT | O14746 | 3/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL514800 | 1.00 | CA2 (0.62) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL15636725 | 0.94 | CA2 (0.64) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL15636724 | 0.94 | CA2 (0.64) | CA2MAPK1CHRM1AKR1A1CHRM3 | |
| SCHEMBL11291007 | 0.93 | CA2 (0.68) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL1116087 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL11301832 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL358162 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL358160 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL3022238 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 | |
| SCHEMBL28430518 | 0.91 | CA2 (0.66) | CA2MAPK1CHRM1TDP1GRIK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 105 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7629424-B2 | Metal-containing compositions and method of making same | PRYOG, LLC (US) | 2009-12-08 | — | — | US | claimed |
| US-20080015278-A1 | Metal-Containing Compositions and Method of Making Same | PRYOG, LLC | 2008-01-17 | — | — | US | claimed |
| WO-2007070092-A2 | METAL-CONTAINING COMPOSITIONS AND METHOD OF MAKING SAME | PRYOG, LLC (US) | 2007-06-21 | — | — | WO | claimed |
| US-7189491-B2 | Photoresist composition for deep UV and process thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2007-03-13 | — | — | US | claimed |
| EP-1379331-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD. (CH) | 2004-01-14 | — | — | EP | claimed |
| US-6610465-B2 | One filter sheet of a self-supported fibrous matrix having immobilized therein a particulate filter aid and a particulate ion exchange resin; other filter sheet of a self supporting matrix of fibers, such as cellulose fibers | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-08-26 | — | — | US | claimed |
| EP-1311908-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2003-05-21 | — | — | EP | claimed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | claimed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | claimed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | claimed |
| EP-1815296-B1 | A COMPOSITION FOR COATING OVER A PHTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2020-02-19 | — | — | EP | disclosed |
| EP-2102156-B1 | PHOTOACTIVE COMPOUNDS | MERCK PATENT GMBH (DE) | 2019-06-26 | — | — | EP | disclosed |
| EP-2598589-B1 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN | MERCK PATENT GMBH (DE) | 2019-05-22 | — | — | EP | disclosed |
| US-9068052-B2 | Polymerizable composition, crosslinkable resin molded body, crosslinked resin molded body, and laminate | ZEON CORPORATION (JP) | 2015-06-30 | — | — | US | disclosed |
| US-20150087782-A1 | POLYMERIZABLE COMPOSITION, CROSSLINKABLE RESIN MOLDED BODY, CROSSLINKED RESIN MOLDED BODY, AND LAMINATE | ZEON CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |
| EP-1311908-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD. (CH) | 2003-05-21 | — | — | EP | disclosed |
| US-20020197555-A1 | Process for producing film forming resins for photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2002-12-26 | — | — | US | disclosed |
| WO-2002084402-A2 | PROCESS FOR PRODUCING FILM FORMING RESINS FOR PHOTORESIST COMPOSITIONS | CLARIANT INTERNATIONAL LTD (CH) | 2002-10-24 | — | — | WO | disclosed |
| US-6447980-B1 | POLY(MALEIC ANHYDRIDE-CO-T-BUTYL 5-NORBORNENE-2-CARBOXYLATE-CO-2-HYDROXYETHYL 5-NORBORNENE-2-CARBOXYLATE-CO-5-NORBORNENE-2-CARBOXYLIC ACID-CO-2-METHYL ADAMANTYL METHACRYLATE-CO-MEVALONIC LACTONE) AND ACID GENERATOR | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-09-10 | — | — | US | disclosed |
| WO-2002006901-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF | CLARIANT INTERNATIONAL LTD (CH) | 2002-01-24 | — | — | WO | disclosed |