Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP1 | P09874 | 3/20 | 0.67 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.48 |
| ▸ | PKM | P14618 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | CES1 | P23141 | 2/20 | 0.47 |
| ▸ | CES2 | O00748 | 1/20 | 0.47 |
| ▸ | BCHE | P06276 | 1/20 | 0.47 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.47 |
| ▸ | PARG | Q86W56 | 1/20 | 0.43 |
| ▸ | CASP7 | P55210 | 3/20 | 0.42 |
| ▸ | PABPC1 | P11940 | 3/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | CASP1 | P29466 | 2/20 | 0.42 |
| ▸ | DNMT1 | P26358 | 2/20 | 0.42 |
| ▸ | GSK3B | P49841 | 1/20 | 0.41 |
| ▸ | TYMS | P04818 | 2/20 | 0.41 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL1028232 | 0.86 | PARP1 (0.49) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL701608 | 0.85 | PARP1 (0.56) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL1895109 | 0.84 | PARP1 (0.74) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL703422 | 0.84 | PARP1 (0.54) | PARP1NPSR1MEN1KMT2APKM | |
| Phthalimide SCHEMBL31168291 | 0.84 | GSK3B (0.60) | PARP1MEN1KMT2ASMN1; SMN2ALDH1A1 | |
| Phthalimide SCHEMBL220034 | 0.84 | GSK3B (0.60) | PARP1MEN1KMT2ASMN1; SMN2ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL18319693 | 0.83 | KMT2A (0.49) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL2487811 | 0.82 | PARP1 (1.00) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL57038 | 0.82 | PARP1 (1.00) | PARP1NPSR1MEN1KMT2APKM | |
| SCHEMBL28149432 | 0.80 | PARP1 (0.67) | PARP1NPSR1MEN1KMT2APKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 290 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116449651-A | Polyimide positive photoresist based on alkali deactivation mechanism | 潍坊星泰克微电子材料有限公司 | 2023-07-18 | — | — | CN | claimed |
| CN-114815506-A | Polyimide positive photoresist based on alkali deactivation mechanism | 潍坊星泰克微电子材料有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-100383666-C | Photoresist composition and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC (KR) | 2008-04-23 | — | — | CN | claimed |
| CN-1619419-A | Photoresist composition and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC (KR) | 2005-05-25 | — | — | CN | claimed |
| CN-1603952-A | Photoresist composition | HYNIX SEMICONDUCTOR INC (KR) | 2005-04-06 | — | — | CN | claimed |
| CN-118284854-A | Positive ultra-thick photoresist composition | 默克专利股份有限公司 | 2024-07-02 | — | — | CN | disclosed |
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| CN-116449651-A | Polyimide positive photoresist based on alkali deactivation mechanism | 潍坊星泰克微电子材料有限公司 | 2023-07-18 | — | — | CN | disclosed |
| US-11681222-B2 | Fluorine-containing polymer, purification method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2023-06-20 | — | — | US | disclosed |
| CN-114815506-A | Polyimide positive photoresist based on alkali deactivation mechanism | 潍坊星泰克微电子材料有限公司 | 2022-07-29 | — | — | CN | disclosed |
| CN-114651212-A | Positive photosensitive material | 默克专利股份有限公司 | 2022-06-21 | — | — | CN | disclosed |
| US-20220137508-A9 | FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2022-05-05 | — | — | US | disclosed |
| EP-1162506-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-6242161-B1 | ABSORPTION COATINGS USING COPOLYMERS | JSR CORPORATION (JP) | 2001-06-05 | — | — | US | disclosed |
| EP-1085379-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-03-21 | — | — | EP | disclosed |
| US-6180316-B1 | SUITABLE FOR USE AS CHEMICALLY AMPLIFIED RESIST USED IN MANUFACTURING OF INTEGRATED CIRCUITS | JSR CORPORATION (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-1048983-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 2000-11-02 | — | — | EP | disclosed |
| EP-1045290-A2 | Composition for resist underlayer film and method for producing the same | JSR Corporation (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-0930541-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-07-21 | — | — | EP | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |