SCHEMBL5155129

SCHEMBL5155129

O=S(=O)(O)OC1CCCCC1

nearest known ligand 0.58

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.58
CA2 P00918 3/20 0.58
EPHX1 P07099 2/20 0.35
CA12 O43570 2/20 0.34
CA9 Q16790 1/20 0.34
GRIN1 Q05586 2/20 0.34
GRIN2B Q13224 2/20 0.34
CA7 P43166 1/20 0.33
CA14 Q9ULX7 1/20 0.33
STS P08842 3/20 0.33
CES2 O00748 1/20 0.32
CES1 P23141 1/20 0.32
CYP2C19 P33261 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11575485 1.00 CA1 (0.58) CA1CA2EPHX1CA12CA9
Ammonia Solution, Strong SCHEMBL27744923 0.97 CA1 (0.56) CA1CA2EPHX1CA12CA9
SCHEMBL3130594 0.97 CA2 (0.54) CA1CA2EPHX1CA12CA9
Ammonia Solution, Strong SCHEMBL15899580 0.93 CA1 (0.52) CA1CA2EPHX1CA12CA9
Trimethylammonium SCHEMBL27920551 0.89 CA1 (0.48) CA1CA2EPHX1GRIN1GRIN2B
SCHEMBL13976245 0.86
SCHEMBL16160748 0.86 CA2 (0.40) CA1CA2GRIN1GRIN2B
SCHEMBL17456540 0.83 CA2 (0.39) CA1CA2GRIN1GRIN2B
SCHEMBL1889311 0.82 GRIN1 (0.40) CA1CA2GRIN1GRIN2B
SCHEMBL17466306 0.79 CA1 (0.41) CA1CA2EPHX1CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020194563-A1 AGENT FOR PREVENTING OR IMPROVING SYMPTOMS OR DISEASE CAUSED BY PHENOLS 国立大学法人東北大学 2020-10-01 WO claimed
EP-1192297-B1 ACIDIC BATH FOR GALVANIC DEPOSITION OF LUSTROUS GOLD AND GOLD ALLOY LAYERS AND LUSTRING ADDITIVE THERFOR DEGUSSA GALVANOTECHNIK GMBH (DE) 2007-01-10 EP claimed
EP-1244827-B1 BATH FOR ELECTROCHEMICALLY DEPOSITING HIGHLY LUSTROUS WHITE RHODIUM COATINGS AND WHITENING AGENT FOR THE SAME UMICORE GALVANOTECHNIK GMBH (DE) 2006-04-19 EP claimed
US-6878411-B2 Bath for the electrochemical deposition of high-gloss white rhodium coatings and whitening agent for the same UMICORE GALVANOTECHNIK GMBH (DE) 2005-04-12 US claimed
US-6814850-B1 EXTENDING CURRENT DENSITY WORKING RANGE; MINIMIZING PH EFFECT; INCREASING CURRENT EFFICIENCY AND DEPOSITION PERFORMANCE; INCLUDING SULFONATE OR SULFATE COMPONENT UMICORE GALVANOTECHNIK GMBH (DE) 2004-11-09 US claimed
US-20030111352-A1 Bath for the electrochemically depositing highly lustrous white rhodium coatings and whitening agent for the same UMICORE GALVANOTECHNIK GMBH (DE) 2003-06-19 US claimed
EP-1192297-A1 ACID BATH FOR GALVANIC DEPOSITION OF SHINING GOLD AND GOLD ALLOY LAYERS AND BRIGHTENER THEREFOR Degussa Galvanotechnik GmbH (DE) 2002-04-03 EP claimed
WO-2000079031-A1 ACID BATH FOR GALVANIC DEPOSITION OF SHINING GOLD AND GOLD ALLOY LAYERS AND BRIGHTENER THEREFOR DEGUSSA GALVANOTECHNIK GMBH (DE) 2000-12-28 WO claimed
CN-113557238-B Lithium borate compound, additive for lithium secondary battery, nonaqueous electrolyte for lithium secondary battery, lithium secondary battery precursor, and method for producing lithium secondary battery 三井化学株式会社 2024-11-01 CN disclosed
CN-113980686-B Preparation method of lateral o-difluorobenzene liquid crystal compound containing cyclohexyl 宁夏中星显示材料有限公司 2023-10-10 CN disclosed
US-11652237-B2 Nonaqueous electrolyte solution including boron compound additive having higher reductive decomposition potential than additional additive and lithium secondary battery including the same MITSUI CHEMICALS, INC. (JP) 2023-05-16 US disclosed
CN-110998957-B Nonaqueous electrolyte for battery and lithium secondary battery 三井化学株式会社 2023-03-24 CN disclosed
CN-110506358-B Nonaqueous electrolyte solution for battery and lithium secondary battery 三井化学株式会社 2022-09-30 CN disclosed
US-20220231336-A1 LITHIUM BORATE COMPOUND, ADDITIVE FOR LITHIUM SECONDARY BATTERY, NONAQUEOUS ELECTROLYTIC SOLUTION FOR LITHIUM SECONDARY BATTERY, PRECURSOR FOR LITHIUM SECONDARY BATTERY, AND PRODUCTION METHOD FOR LITHIUM SECONDARY BATTERY MITSUI CHEMICALS, INC. (JP) 2022-07-21 US disclosed
EP-0340827-A1 Process for the preparation of cyclohexanol and/or cyclohexanone DSM N.V. (NL) 1989-11-08 EP disclosed
EP-0023379-B1 METHOD FOR THE PREPARATION OF CYCLOHEXANOL AND/OR CYCLOHEXANONE STAMICARBON B.V. (NL) 1983-07-27 EP disclosed
US-4339604-A Method for the preparation of cyclohexanol and/or cyclohexanone STAMICARBON, B.V. (NL) 1982-07-13 US disclosed
EP-0053847-A1 Process for the preparation of cyclohexanol and/or cyclohexanone STAMICARBON B.V. (NL) 1982-06-16 EP disclosed
EP-0023379-A2 Method for the preparation of cyclohexanol and/or cyclohexanone STAMICARBON B.V. (NL) 1981-02-04 EP disclosed
US-3988379-A Manufacture of cyclohexanol from cyclohexene BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) 1976-10-26 US disclosed