Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHAT | P28329 | 5/20 | 0.61 |
| ▸ | RAD52 | P43351 | 3/20 | 0.56 |
| ▸ | HTT | P42858 | 4/20 | 0.56 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.56 |
| ▸ | RAB9A | P51151 | 4/20 | 0.56 |
| ▸ | PKM | P14618 | 3/20 | 0.56 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.56 |
| ▸ | MEN1 | O00255 | 3/20 | 0.56 |
| ▸ | NPC1 | O15118 | 3/20 | 0.56 |
| ▸ | POLB | P06746 | 3/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | NSD2 | O96028 | 2/20 | 0.56 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.56 |
| ▸ | APP | P05067 | 5/20 | 0.55 |
| ▸ | MAPT | P10636 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | RECQL | P46063 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4626049 | 0.89 | CHAT (0.77) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL4626052 | 0.89 | CHAT (0.77) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL9393622 | 0.86 | CHAT (0.56) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL9397403 | 0.86 | CHAT (0.56) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL6554349 | 0.86 | CHAT (0.49) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL10347865 | 0.82 | CHAT (0.51) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL29053037 | 0.78 | RAD52 (0.36) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL13766059 | 0.76 | CHAT (0.79) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL4609887 | 0.76 | CHAT (0.53) | CHATRAD52HTTNPSR1RAB9A | |
| SCHEMBL7049655 | 0.76 | RAB9A (0.54) | CHATRAB9AMEN1NPC1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1200049-B1 | AGENT FOR DYING KERATIN FIBERS | HENKEL KGAA (DE) | 2007-02-21 | — | — | EP | disclosed |
| EP-0942328-B1 | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards | GOO CHEMICAL CO LTD (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-6475702-B2 | WATER SOLUBILITY RESIN | GOO CHEMICAL CO., LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| EP-1200049-A1 | AGENT FOR DYING KERATIN FIBERS | Henkel Kommanditgesellschaft auf Aktien (DE) | 2002-05-02 | — | — | EP | disclosed |
| US-20020022194-A1 | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards | GOO CHEMICAL CO., LTD. | 2002-02-21 | — | — | US | disclosed |
| US-6322952-B1 | REACTION PRODUCT OF A VINYL ALCOHOL POLYMER WITH A STYRYLPYRIDINIUM OR STYRENEQUINOLINIUM COMPOUND OR WITH A HYDROXYALKYL(METH)ACRYLAMIDE; POLYUNSATURATEDD CARBOXYL GROUP CONTAINING PREPOLYMER; PHOTOINITIATOR; WATER | GOO CHEMICAL CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-6238841-B1 | RESIN OBTAINED BY INTRODUCING A STYRYLPYRIDINIUM, STYRYLQUINOLINIUM OR METHYLOLAMIDE GROUP INTO A POLYVINYL ALCOHOL POLYMER; PREPOLYMER HAVING CARBOXYL GROUP AND AT LEAST TWO ETHYLENICALLY UNSATURATED GROUPS IN MOLECULE; EPOXIDE | GOO CHEMICAL CO., LTD. (JP) | 2001-05-29 | — | — | US | disclosed |
| WO-2001010398-A1 | AGENT FOR DYING KERATIN FIBERS | HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) | 2001-02-15 | — | — | WO | disclosed |
| US-6136507-A | WATER-SOLUBLE PHOTOSENSITIVE RESIN OBTAINED BY INTRODUCING STYRYL PYRIDINIUM GROUP INTO A POLYVINYL ALCOHOL POLYMER, SECOND RESIN OBTAINED BY INTRODUCING STYRYL QUINOLINIUM GROUP, THIRD RESIN OBTAINED BY INTRODUCING ALKYLOL ACRYLAMIDE | GOO CHEMICAL CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-0942328-A1 | Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards | Goo Chemical Co., Ltd. (JP) | 1999-09-15 | — | — | EP | disclosed |
| EP-0261981-B1 | PHOTOSENSITIVE RESIN COMPOSITION | Director-General of the Agency of Industrial Science and Technology (JP) | 1990-05-16 | — | — | EP | disclosed |
| US-4891300-A | SCREEN PRINTING PLATES | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE AND INDUSTRY (JP) | 1990-01-02 | — | — | US | disclosed |
| US-4777114-A | AQUEOUS EMULSION OF FILM FORMING RESIN PROTECTIVE COLLOID CONTAINING PHOTOSENSITIVE AND HYDROPHOBIC SEGMENTS | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1988-10-11 | — | — | US | disclosed |
| EP-0261981-A2 | Photosensitive resin composition | Director-General of the Agency of Industrial Science and Technology (JP) | 1988-03-30 | — | — | EP | disclosed |