Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP3 | P05413 | 1/20 | 0.47 |
| ▸ | FABP4 | P15090 | 1/20 | 0.47 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | BCL2 | P10415 | 2/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 2/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | FYN | P06241 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.36 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.36 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.36 |
| ▸ | EIF4A3 | P38919 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21019461 | 0.84 | FABP3 (0.48) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL18309202 | 0.83 | FABP3 (0.52) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL29077088 | 0.78 | FABP3 (0.44) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL23879428 | 0.77 | FABP3 (0.42) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL18309199 | 0.76 | FABP3 (0.50) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL18309171 | 0.76 | FABP3 (0.45) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL29924059 | 0.74 | HSP90AA1 (0.53) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL28916218 | 0.74 | FABP3 (0.44) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL13049116 | 0.74 | ACE2 (0.46) | FABP3FABP4ACE2ALDH1A1BCL2 | |
| SCHEMBL18677495 | 0.74 | HSP90AA1 (0.53) | FABP3FABP4ACE2ALDH1A1BCL2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1013650-B1 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | HITACHI CHEM DUPONT MICROSYS (JP) | 2007-01-24 | — | — | EP | disclosed |
| US-6600053-B2 | Useful for producing polyimide precursors or polyimides having low thermal expansion and low residual stress | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2003-07-29 | — | — | US | disclosed |
| US-20020037991-A1 | Photosensitive resin composition | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2002-03-28 | — | — | US | disclosed |
| US-6329494-B1 | HIGH-SPEED DEVELOPABILITY, HIGH RESOLUTION AND GOOD DIMENSIONAL ACCURACY TO SUIT THEM TO THE PRODUCTION OF INTERLAYER INSULATING FILMS OR SURFACE-PROTECTING FILMS IN SEMICONDUCTOR DEVICES | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2001-12-11 | — | — | US | disclosed |
| EP-1013650-A2 | Tetracarboxylic dianhydride, derivative and production thereof, polyimide precursor, polyimide, resin composition, photosensitive resin composition, method of forming relief pattern, and electronic part | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2000-06-28 | — | — | EP | disclosed |