⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15823515 | 1.00 | — | — | |
| SCHEMBL19937561 | 1.00 | — | — | |
| Phosphoramidic Acid SCHEMBL7929261 | 0.84 | LAP3 (0.31) | — | |
| SCHEMBL18199910 | 0.78 | — | — | |
| SCHEMBL27939373 | 0.78 | — | — | |
| SCHEMBL6909520 | 0.78 | — | — | |
| SCHEMBL1485893 | 0.75 | — | — | |
| SCHEMBL13194684 | 0.75 | — | — | |
| SCHEMBL16011585 | 0.75 | — | — | |
| SCHEMBL12327291 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023192701-A1 | MEMBRANES FOR THE SEPARATION OF H2S FROM H2S-CO2 MIXTURES | OHIO STATE INNOVATION FOUNDATION (US) | 2023-10-05 | — | — | WO | claimed |
| WO-2023192701-A1 | MEMBRANES FOR THE SEPARATION OF H2S FROM H2S-CO2 MIXTURES | OHIO STATE INNOVATION FOUNDATION (US) | 2023-10-05 | — | — | WO | disclosed |
| CN-110520452-B | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | 三菱化学株式会社 | 2022-08-02 | — | — | CN | disclosed |
| CN-111560180-B | Composition, cured product and article | 荒川化学工业株式会社 | 2022-07-05 | — | — | CN | disclosed |
| CN-112166162-B | Antifouling coating composition | 三菱化学株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-110506064-B | (meth) acrylic copolymer, method for producing same, resin composition, and antifouling coating composition | 三菱化学株式会社 | 2022-06-03 | — | — | CN | disclosed |
| CN-107207819-B | Antifouling coating composition | 三菱化学株式会社 | 2021-06-22 | — | — | CN | disclosed |
| CN-108137751-B | (meth) acrylic copolymer, process for producing the same, resin composition, and antifouling paint composition | 三菱化学株式会社 | 2021-04-27 | — | — | CN | disclosed |
| CN-112166162-A | Antifouling coating composition | 三菱化学株式会社 | 2021-01-01 | — | — | CN | disclosed |
| CN-111560180-A | Composition, cured product and article | 荒川化学工业株式会社 | 2020-08-21 | — | — | CN | disclosed |
| US-5558803-A | ADDITION-CONDENSATION GRAFT COPOLYMERS FOR DIELECTRIC PARTICLES AND INSULATING LIQUIDS | NIPPON SHOKUBAI CO., LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5530150-A | HAVING PHOSPHINE AND PHOSPHITE GROUPS IN SAME MOLECULE; CATALYST SELECTIVITY | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1996-06-25 | — | — | US | disclosed |
| EP-0684249-A1 | Phosphine compounds, complexes containing the phosphine compounds as ligands, and process for producing optically active aldehydes using the phosphine compounds or complexes | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0684230-A1 | 4- (R)-1'-formylethyl azetidin-2-one derivatives | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| US-5376294-A | A dielectric particle and a polysiloxane/acrylic ester additive in a dielectric dispersant medium; large shear stress and low current density; stability; nonsettling | NIPPON SHOKUBAI CO., LTD. (JP) | 1994-12-27 | — | — | US | disclosed |
| EP-0614870-A2 | Process for producing optically active aldehydes | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0614903-A2 | Phosphine compounds, complexes containing the phosphine compounds as ligands, process for producing optically active aldehydes using the phosphine compounds, or complexes, and 4-[(R)-1' formylethyl]azetidin-2-one derivatives | Takasago International Corporation (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |
| US-3953408-A | LITHOGRAPHIC PLATES | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) | 1976-04-27 | — | — | US | disclosed |