SCHEMBL516425

SCHEMBL516425

CCCC/C=C/N(/C=C/CCCC)/C=C/CCCC

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.41
ALDH1A1 P00352 2/20 0.41
FAAH O00519 2/20 0.39
TRPV1 Q8NER1 2/20 0.39
F7 P08709 1/20 0.38
F3 P13726 1/20 0.38
LPAR2 Q9HBW0 2/20 0.33
LPAR3 Q9UBY5 2/20 0.33
GMNN O75496 1/20 0.33
USP2 O75604 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
POLB P06746 1/20 0.33
MAPT P10636 1/20 0.33
CYP2C9 P11712 1/20 0.33
ALOX15 P16050 1/20 0.33
APEX1 P27695 1/20 0.33
CYP2C19 P33261 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL516426 1.00 TSHR (0.41) TSHRALDH1A1FAAHTRPV1F7
SCHEMBL5431014 0.92 FAAH (0.48) TSHRALDH1A1FAAHTRPV1F7
SCHEMBL5431017 0.92 FAAH (0.48) TSHRALDH1A1FAAHTRPV1F7
SCHEMBL5433010 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL9271116 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL5428204 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL5441819 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL10493433 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL5440079 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3
SCHEMBL5441824 0.89 FAAH (0.52) TSHRFAAHTRPV1F7F3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2738010-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE FUJIFILM Corporation (JP) 2014-06-04 EP disclosed
EP-2481583-B1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same FUJIFILM CORP (JP) 2014-05-28 EP disclosed
US-20140130693-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2014-05-15 US disclosed
EP-2393666-B1 RELIEF PRINTING PLATE FUJIFILM CORP (JP) 2014-01-15 EP disclosed
US-8618208-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same FUJIFILM CORPORATION (JP) 2013-12-31 US disclosed
US-8541534-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate FUJIFILM CORPORATION (JP) 2013-09-24 US disclosed
US-20130133537-A1 RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2013-05-30 US disclosed
EP-2565046-A2 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate Fujifilm Corporation (JP) 2013-03-06 EP disclosed
US-20130047878-A1 RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE FUJIFILM CORPORATION (JP) 2013-02-28 US disclosed
EP-2301750-B1 Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same FUJIFILM CORP (JP) 2012-10-31 EP disclosed
US-4900856-A Preparation of metal halide-amine complexes ETHYL CORPORATION (US) 1990-02-13 US disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
US-4866191-A USING OXYGEN, CARBON MONOXIDE, NITROGEN OXIDES OR ALKYL NITRITES ETHYL CORPORATION (US) 1989-09-12 US disclosed
EP-0291776-A2 Stabilization of amine alanes ETHYL CORPORATION (US) 1988-11-23 EP disclosed
US-4782171-A WITH OXYGEN, CARBON MONOXIDE, NITROGEN OXIDE AND ALKYL NITRITES ETHYL CORPORATION (US) 1988-11-01 US disclosed
US-4757154-A Reacting alkali metal aluminum tetrahydride, silicon tetrachloride, complexing tertiary amine ETHYL CORPORATION (US) 1988-07-12 US disclosed
EP-0273229-A2 Preparation of amine alanes ETHYL CORPORATION (US) 1988-07-06 EP disclosed
US-4748260-A Preparation of amine alanes ETHYL CORPORATION (US) 1988-05-31 US disclosed
US-4730070-A PASSIVATION OF TITANIUM CATALYST ETHYL CORPORATION (US) 1988-03-08 US disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed