⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL516460 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL22771737 | 0.97 | TRPA1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL22771735 | 0.97 | TRPA1 (0.30) | — | |
| SCHEMBL5403190 | 0.79 | CA12 (0.30) | — | |
| SCHEMBL5403187 | 0.79 | CA12 (0.30) | — | |
| SCHEMBL2142076 | 0.78 | — | — | |
| SCHEMBL516701 | 0.75 | — | — | |
| SCHEMBL4710496 | 0.75 | — | — | |
| SCHEMBL1219210 | 0.75 | — | — | |
| SCHEMBL4710497 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170144992-A1 | NOVEL FLUOROQUINOLONES AND USE THEREOF TO TREAT BACTERIAL INFECTIONS | UNIVERSITÉ PIERRE ET MARIE CURIE - PARIS 6 (UPMC) (FR) | 2017-05-25 | — | — | US | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| EP-2481583-B1 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, and relief printing plate and process for making the same | FUJIFILM CORP (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20130133537-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME | FUJIFILM CORPORATION (JP) | 2013-05-30 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20130047878-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20050038253-A1 | Method for production of alkali metal dialkylamides | BASF AKTIENGESELLSCHAFT (DE) | 2005-02-17 | — | — | US | disclosed |
| EP-1451141-A2 | METHOD FOR PRODUCTION OF ALKALI METAL DIALKYLAMIDES | BASF AKTIENGESELLSCHAFT (DE) | 2004-09-01 | — | — | EP | disclosed |
| EP-1448510-A1 | METHOD AND DEVICE FOR PRODUCING ETHYLAMINE AND BUTYLAMINE | BASF AKTIENGESELLSCHAFT (DE) | 2004-08-25 | — | — | EP | disclosed |
| WO-2003042154-A2 | METHOD FOR PRODUCTION OF ALKALI METAL DIALKYLAMIDES | BASF AKTIENGESELLSCHAFT (DE) | 2003-05-22 | — | — | WO | disclosed |
| WO-2003042157-A1 | METHOD AND DEVICE FOR PRODUCING ETHYLAMINE AND BUTYLAMINE | BASF AKTIENGESELLSCHAFT (DE) | 2003-05-22 | — | — | WO | disclosed |
| EP-0526895-A2 | Epoxy resin composition for sealing | MITSUBISHI RAYON CO., LTD (JP) | 1993-02-10 | — | — | EP | disclosed |
| EP-0249858-B1 | FLUORALKYLSUBSTITUTED QUINOLINE DERIVATIVES, THEIR SYNTHESIS AND USE AGAINST UNWANTED PLANT GROWTH | BASF Aktiengesellschaft (DE) | 1990-12-05 | — | — | EP | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| US-4804404-A | HERBICIDES | BASF AKTIENGESELLSCHAFT (DE) | 1989-02-14 | — | — | US | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |